In this work, a-C:H:Si (DLC-Si) films were produced onto crystalline silicon and polycarbonate substrates by the rf-PACVD technique from gaseous mixtures of CH 4 + SiH 4 and C 2 H 2 + SiH 4 . The effects of self-bias and gas composition upon mechanical and optical properties of the films were investigated. Micro-hardness, residual stress, surface roughness and refractive index measurements were...

This study investigated the effects of deposition techniques on the microstructural and tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel substrate. The coatings were produced using cathodic arc physical vapor deposition (CAPVD) and plasma-assisted chemical vapor deposition (PACVD). The microstructural of the coatings was evaluated using (SEM), and phase f...

Frictional behavior of nano-undulated diamond-like carbon (DLC) films deposited by plasma assisted chemical vapor deposition (PACVD) process was investigated. In order to prepare the nano-undulated DLC film, a Si wafer with nano-sized Ni dots was prepared by rapid thermal annealing of Ni thin films. Since the structure of DLC film deposited by PACVD was independent of the substrate materials an...

The adhesion of PACVD TiN films on tool steel ( AISI Pa ) has been investigated as a function of interfacial chemistry and the metallic interlayer formation between TiN films and substrate steel. Prior to TiN deposition, thin metallic interlayers such as T i , Cr, Cu films were deposited on a steel substrate with thickness range of 200 2000 A by Magnetron qxtterhg. TiN films were deposited by R...

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...