nanoscale science and technology has today mainly focused on the fabrication of nano devices. in this paper, we study the use of lithography process to build the desired nanostructures directly. nanolithography on polymethylmethacrylate (pmma) surface is carried out by using atomic force microscope (afm) equipped with silicon tip, in contact mode. the analysis of the results shows that the dept...

today radiology and imaging are the only and main method to generate geometrical data from body. 3d model of the body will give us the best and reliable information for better understanding and diagnostic. on the other hand with development of cad/cam and rapid prototyping, the 3d printers were born to build 3d models without considering the geometry. today the 3d printers are able to makes a 3...

SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovativ...

As optical lithography reaches it physical limits, alternative technologies become interesting. There have been several such alternatives that are still optical, but have some departure from conventional projection methods. This papers presents some of these alternative optical technologies, namely the use of surface plasmons and plasmonic lithography, metamaterials and superlenses, evanescent ...

3.2. Two-Photon Lithography (TPL) 919 4. Serial Writing with Charged Particles 920 4.1. Electron Beam Lithography 920 4.2. Ion Beam Lithography 920 4.3. Scanning Probe Resist Lithography 921 5. Microand Nanomachining 921 5.1. Focused Ion Beam 921 5.2. Scanning Probe Nanomachining 921 6. Direct Writing and Material Deposition 921 7. Moulding 922 7.1. Mould Fabrication 922 7.2. Demoulding: Mould ...

The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...

the scanning probe microscopes (spms) based lithographic techniques have been demonstrated as an extremely capable patterning tool. manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. in this paper, a qualified overview of diverse lithog...

Advances in lithography have contributed significantly to the advancement of the integrated circuit technology. While nonoptical next-generation lithography (NGL) solutions are being developed, optical lithography continues to be the workhorse for high-throughput very-large-scale integrated (VLSI) lithography. Extending optical lithography to the resolution levels necessary to support today’s a...