نتایج جستجو برای: cvd processes

تعداد نتایج: 544582  

Journal: :international journal of nano dimension 0
ghazaleh allaedini department of chemical and process engineering, universitikebangsaan malaysia, 43600 bangi, selangor, malaysia. siti masrinda tasirin department of chemical and process engineering, universitikebangsaan malaysia, 43600 bangi, selangor, malaysia. payam aminayi chemical and paper engineering, western michigan university, kalamazoo, michigan, usa. zahira yaakob department of chemical and process engineering, universitikebangsaan malaysia, 43600 bangi, selangor, malaysia. meor zainal meor talib department of chemical and process engineering, universitikebangsaan malaysia, 43600 bangi, selangor, malaysia.

this review paper provides researcherwith a comprehensive information about the carbon nano tubes and the catalyst parameters that influences theproduction and morphology of the of carbon nano tubes.carbon nanotubes, referred to as cnts, are one of the most important materials used in electrical, mechanical, thermal, chemical and textile industries. since discovery of cnts in 1991, many scienti...

Journal: :Journal of The Electrochemical Society 1982

Journal: :Chemical Engineering and Processing: Process Intensification 2008

Journal: :JCIT 2010
Jürgen Geiser Robert Röhle

Abstract In this paper we present a kinetic model based on numerical simulations of a chemical vapor deposition (CVD) process. We discuss a model that is based on kinetics of the deposition rates to the material. Such a kinetic model helps to explain the experimental results and reduce expensive real-life studies. We concentrate on experiments with 3 2 Ti SiC and we verify our model based on te...

2018
WERNER

A review is given on actual numerical models for CVD equipment and processes. While the basic work concerning the differential equations and the boundary conditions has been established already a decade or more ago, the more recent availability of increased computing power has enabled simulation to become a predictive tool in equipment and process design. The present task in CVD simulation incl...

2002
V. Hopfe A. Beil M. Pemble R. Weiss

Aiming toward process control of industrial high yield / high volume CVD reactors, the potential of optical sensors as a monitoring tool has been explored. The sensors selected are based on both Fourier transform infrared spectroscopy (FTIR) and tunable diode laser spectroscopy (NIR-DLS). The former has the advantage of wide spectral capability, and well established data bases. NIR-DLS spectros...

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