نتایج جستجو برای: chemical passivation

تعداد نتایج: 381255  

2014
Rui Liu Zhi Zheng Joshua Spurgeon Xiaogang Yang

An important approach for solving the world's sustainable energy challenges is the conversion of solar energy to chemical fuels. Semiconductors can be used to convert/store solar energy to chemical bonds in an energy-dense fuel. Photoelectrochemical (PEC) water-splitting cells, with semiconductor electrodes, use sunlight and water to generate hydrogen. Herein, recent studies on improving the ef...

2013
Omer Yaffe Tal Ely Rotem Har-Lavan David A. Egger Steve Johnston Hagai Cohen Leeor Kronik Ayelet Vilan David Cahen

We report on the passivation properties of molecularly modified, oxide-free Si(111) surfaces. The reaction of 1-alcohol with the H-passivated Si(111) surface can follow two possible paths, nucleophilic substitution (SN) and radical chain reaction (RCR), depending on adsorption conditions. Moderate heating leads to the SN reaction, whereas with UV irradiation RCR dominates, with SN as a secondar...

Abstract   Background and Aim: Biocompatibility in some respects depends on the corrosion behavior of dental alloys. The purpose of this study was to investigate the effect of surface passivation of a cobalt chromium alloy on corrosion behavior. Materials and methods: In this experimental study, 20 samples of Flexicast dental alloy were prepared according to ADA97 standard and after casting, t...

2013
Yan Zhao Chunlan Zhou Xiang Zhang Peng Zhang Yanan Dou Wenjing Wang Xingzhong Cao Baoyi Wang Yehua Tang Su Zhou

Thermal atomic layer-deposited (ALD) aluminum oxide (Al2O3) acquires high negative fixed charge density (Qf) and sufficiently low interface trap density after annealing, which enables excellent surface passivation for crystalline silicon. Qf can be controlled by varying the annealing temperatures. In this study, the effect of the annealing temperature of thermal ALD Al2O3 films on p-type Czochr...

2017
Ming Zhu Rui Wang Chen Chen Haibin Zhang Guojun Zhang

As a newly developed conductive ceramic with wide application prospects, the electrochemical corrosion behavior of Ti3SiC2 in 3.5% NaCl solution was investigated by potentiodynamic polarization, potentiostatic polarization and electrochemical impedance spectroscopy. Commercially pure titanium (CP Ti) was selected for comparative, and cooperated with XRD, XPS, SEM, the passivation behavior, corr...

2016
Mohammad Al-Amin John D. Murphy

We have performed a comprehensive study into low temperature ( 500 °C) internal gettering in multicrystalline silicon (mc-Si). Two groups of as-grown mc-Si wafers from different ingot height positions were subjected to the same thermal treatments with surface passivation by either silicon nitride (SiNx:H) or a temporary iodine-ethanol (I-E) chemical solution . With either passivation scheme, l...

Journal: :Physical chemistry chemical physics : PCCP 2016
Roya Rudd Colin Hall Peter J Murphy Peter J Reece Eric Charrault Drew Evans

Semiconductor (SC) quantum dots (QDs) have recently been fabricated by both chemical and plasma techniques for specific absorption and emission of light. Their optical properties are governed by the size of the QD and the chemistry of any passivation at their surface. Here, we decouple the effects of confinement and passivation by utilising DC magnetron sputtering to fabricate SC QDs in a perfl...

2014
J. Przondziono

The study comprises evaluation of suitability of passive layer created on the surface of AISI 316L stainless steel for products that are intended to have contact with blood. For that purpose, prior to and after chemical passivation, samples were subject to 7 day exposure in artificial plasma at the temperature of T=37°C. Next, tests of metallic ions infiltration from the surface to the solution...

2016
David Sperber Axel Herguth Giso Hahn

Hydrogenated silicon nitride and aluminum oxide passivation layers were deposited on boron doped floatzone silicon wafers that underwent a high temperature firing step. The passivation quality was monitored during thermal treatment at 75°C, 150°C and 250°C in darkness or under illumination. It was found that the passivation quality of the specific layers under investigation is far from stable i...

2014
Vandana Neha Batra Jhuma Gope Rajbir Singh Jagannath Panigrahi Sanjay Tyagi P Pathi SK Srivastava CMS Rauthan

Thermal ALD deposited Al2O3 films on silicon show marked difference in surface passivation quality as a function of annealing time (using rapid thermal process). An effective and quality passivation is realized in short anneal duration (~100s) which is reflected in the low surface recombination velocity (SRV <10 cm/s). The deduced values are close to the best reported SRV obtained by high therm...

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