نتایج جستجو برای: butylacrylate

تعداد نتایج: 55  

Journal: :Chemical communications 2009
Jean-François Gohy Christina Ott Stephanie Hoeppener Ulrich S Schubert

Multicompartment micelles with tunable compartment solubility have been prepared in alcohols from a metallo-supramolecular poly(p-tetrafluoromethylstyrene)-block-poly(tert-butylacrylate)-block-poly(styrene)-[Ru]-poly(ethylene glycol) tetrablock quaterpolymer.

Journal: :Journal of the American Chemical Society 2002
Christopher S Colley David C Grills Nicholas A Besley Steffen Jockusch Pavel Matousek Anthony W Parker Michael Towrie Nicholas J Turro Peter M W Gill Michael W George

A series of substituted benzoyl radicals has been generated by laser flash photolysis of alpha-hydroxy ketones, alpha-amino ketones, and acyl and bis(acyl)phosphine oxides, all of which are used commercially as photoinitiators in free radical polymerizations. The benzoyl radicals have been studied by fast time-resolved infrared spectroscopy. The absolute rate constants for their reaction with n...

Journal: :Chemical communications 2005
Jérôme Babin Céline Leroy Sébastien Lecommandoux Redouane Borsali Yves Gnanou Daniel Taton

Water-soluble stimuli-responsive AB2 miktoarm star copolymers were prepared by atom transfer radical polymerisation of styrene followed by chain-end modification, polymerisation of either gamma-benzyl-L-glutamate N-carboxyanhydride or tert-butylacrylate and a final step of hydrolysis.

Journal: :The Journal of the Society of Chemical Industry, Japan 1959

2010
Christopher K. Ober Christine Ouyang

The chemical waste generated in today’s microelectronic fabrication processes has driven the need to develop a more environmentally benign process. Silicone fluids are linear methyl siloxanes that are non-toxic, not ozonedepleting and can be easily recycled. They are used as environmentally friendly alternatives in this study to develop conventional photoresists. After silylation, two conventio...

Journal: :The Journal of the Society of Chemical Industry, Japan 1971

Journal: :Nanoscale 2014
Woon Ik Park Sheng Tong Yuzi Liu Il Woong Jung Andreas Roelofs Seungbum Hong

Pattern generation of well-controlled block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. We used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and ...

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