We developed a thin-film nitride thermistor on resin substrate with high heat resistance by focusing the interface between polyimide (PI) and (Al,Ti)N film. Heat properties of thermistors are degraded an amorphous oxynitride layer PI that forms during initial stage sputtering. propose introduction inorganic insulating underlayer at to prevent formation phase. As result, highly crystalline was g...

Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions performed in the metal compound modes using nitrogen flow rates (7.2 ± 0.1) sccm (6.8 0.2) sccm, respectively. relations between process parameters crystallographic orientati...

Sputtering made ZnO thin film was used as an electron-transport layer in a regular planar perovskite solar cell based on high quality CH3NH3PbI3 absorber prepared with a two-step spin-coating. An efficiency up to 15.9% under AM 1.5G irradiation is achieved for the cell based on ZnO film fabricated under Ar working gas. The atmosphere of the sputtering chamber can tune the surface electronic pro...

Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a...

Nano-structured CuO-Cu2O complex thin film-based perovskite solar cells were fabricated on an indium tin oxide (ITO)-coated glass and studied. Copper (Cu) thin films with a purity of 99.995 % were deposited on an ITO-coated glass by magnetron reactive sputtering. To optimize the properties of the nano-structured CuO-Cu2O complex thin films, the deposited Cu thin films were thermally oxidized at...

Bismuth vanadate (BiVO4) has attracted increasing attention as a photoanode for photoelectrochemical (PEC) water splitting. It has a band gap in the visible light range (2.4−2.5 eV) and a valence band position suitable for driving water oxidation under illumination. While a number of methods have been used to make BiVO4 photoanodes, scalable thin film deposition has remained relatively underexp...

Selective growth of boron nitride nanotubes (BNNTs) was demonstrated by plasma-enhanced pulsed laser deposition (PE-PLD). Although PLD is a physical vapor deposition technique for the growth of boron nitride (BN) thin films, ion sputtering induced by the plasma can eliminate the formation of BN thin films and lead to the so-called total resputtering region, in which, a pure phase of BNNTs can b...

Reactive sputtering is becoming a more widely accepted practice for the deposition of many useful compound thin films. The use of closed-loop control for the deposition of such films is also increasing in popularity. The closed-loop process for forming binary compounds, typically oxides or nitrides, is conveniently accomplished using one of several feedback mechanisms coupled to a high-speed re...

In this paper the influence of material composition on the structural, surface and optical properties of HfO2-TiO2 mixed oxide coatings was investigated and discussed. Five sets of thin films were deposited using reactive magnetron sputtering: HfO2, TiO2 and three sets of mixed HfO2-TiO2 coatings with various titanium content. The change in the material composition had a significant influence o...