Current status and challenges of aggressive equivalent-oxide-thickness (EOT) scaling of high-κ gate dielectrics via higher-κ ( > 20) materials and interfacial layer (IL) scavenging techniques are reviewed. La-based higher-κ materials show aggressive EOT scaling (0.5-0.8 nm), but with effective workfunction (EWF) values suitable only for n-type field-effect-transistor (FET). Further exploration ...

The exceptional capability of plasmonic structures to confine light into deep subwavelength volumes has fashioned rapid expansion of interest from both fundamental and applicative perspectives. Surface plasmon nanophotonics enables to investigate light-matter interaction in deep nanoscale and harness electromagnetic and quantum properties of materials, thus opening pathways for tremendous poten...

In this work, for the first time, the valence band offset, ∆EV, between strained Si and strained Si1-yGey on relaxed Si1-xGex, has been measured using a combination of experimentation and modeling. Such structures have been shown to offer large mobility enhancements for both electrons and holes, and knowledge of the band parameters is critical in order to optimize and predict device behavior [1...

Abstract The detection of biomolecules has been accomplished in this article by using the tunnel field effect transistor’s (TFET) bipolar nature. fabrication procedure made simpler, prices have gone down, and random dopant fluctuation (RDFs) eliminated charge plasma concept. objective work is to investigate performance a DopingLess- Dual Metal Gate- Cavity- HeteroJunction- Tunnel Field Effect T...

Abstract: In this paper, a novel tunnel field effect transistor (TFET) is introduced, thatdue to its superior gate controllability, can be considered as a promising candidate forthe conventional TFET. The proposed electrically doped heterojunction TFET(EDHJTFET) has a 3D core-shell nanotube structure with external and internal gatessurrounding the channel that employs el...

At present, an important issue is to dispose of electrical models describing the interplay between the observed phenomenology in CNT-FETs. These models are intended to serve as guidelines for the design and projection of CNT-FET performances. In this work we propose a physics-based model for CNT-FETs for computing the transfer and output characteristics. The model captures the observed phenomen...

In this paper, the electrical characteristics and sensitivity analysis of staggered type p-channel heterojunction electron-hole bilayer tunnel field effect transistor (HJ-EHBTFET) are thoroughly investigated via simulation study. The minimum lattice mismatch between InAs/GaAs0.1Sb0.9 layers besides low carrier effective mass of materials provides high probability ...

In this paper, we propose a new heterostructure dual material gate junctionless field-effect transistor (H-DMG-JLFET), with negative differential resistance (NDR) characteristic. The drain and channel material are silicon and source material is germanium. The gate electrode near the source is larger. A dual gate material technique is used to achieve upward band bending in order to access n-i-p-...

It has been clear for a number of years that increasing transistor gate leakage with device scaling would ultimately necessitate an alternative to traditional SiON dielectrics with polysilicon gates. Material systems providing higher dielectric constants, and therefore allowing physically thicker dielectrics, have been the object of extensive research. Such high-k dielectrics, when combined wit...

Graphene, which consists of a single atom-thick plane of carbon atoms arranged in a honeycomb lattice, exhibits unique both " bulk " and " surface " properties of materials due to its tunable electronic structure. In this talk, I would like to present the tunable platform of graphene-based materials including graphene and graphene oxide in optical, electronic and photonic applications by manipu...