Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on total energy cathodes, which means voltage settings do not necessarily match actual output. In this study, we investigated effects and characteristics titanium nitride thin films produced using sputtering. The values were adjusted by varying supplied ca...

In this study, metal films are fabricated by using an in-line reactive direct current magnetron sputtering system. The aluminum–titanium (AlTi) back contacts are prepared by changing the pressure from 10 mTorr to 25 mTorr. The optical, electrical and structural properties of the metal back contacts are investigated. The solar cells with the AlTi had lower contact resistance than those with the ...

Titanium is a highly reactive metal so that a thin layer of oxide forms on its surface whenever exposed to the air or other environments containing oxygen. This layer increases the corrosion resistance of titanium. The oxide film is electrochemically formed through anodizing. In this study, anodizing of titanium was performed in phosphate-base solutions such as H3Po4, NaH2Po4, and Na2Hpo4 at 9....

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

Titanium oxide (TiO2) thin films were deposited by RF magnetron sputtering on Si and glass substrates. The microstructure, surface morphology, and optical properties of the thin films were investigated by grazing incidence X-ray diffraction (GIXD), transmission electron microscopy (TEM), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), and UV/VIS spectrophoto...

Thin films of amorphous carbon and amorphous, graphitic and fullerene-like carbon nitride were deposited by reactive magnetron sputtering and optically characterized with spectroscopic ellipsometry. Complementary studies using scanning electron microscopy and atomic force microscopy were performed. The films were exposed to human serum albumin (HSA) and the adsorption was monitored in situ usin...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...