This article describes an accurate subPico flowmeter bifurcatedin to liquid and gas flowrates less than 1mol/s for both MEMS/NEMS and cryogenic technology applications. The MEMS/NEMS are described as either two Gauges (instrument), or quartz fluctuating forks, even if the liquid or gas flows through an element, as well as cryogenic technology consisting of arrays of e...

A technique for synthesizing nanostructures by current lithography in a scanning tunneling microscope (STM lithography) layered Au/Si structures has been developed. An experimental dependence of the geometric dimensions created on time STM obtained. theoretical model growth is proposed, which explains nonlinear radius obtained with saturation region large radii. Keywords: nanostructures, lithog...

The design, fabrication, and measurement of planar, passive Bragg grating-based transmission filters is presented. We combine interferometric lithography, spatial-phase-locked electron-beam lithography, x-ray nanolithography, and optical lithography with silica-on-silicon waveguiding substrates to define rib waveguides and grating patterns that have multiple quarter-wave shifts along the gratin...

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In this paper we summarize some recent results on mean residual lifetime (MRL) and the mean past lifetime (MPL) of a k-out-of-n structure at the system level. In section 2, it is assumed that in a k-out-of-n system all the components of the system are working at time t. Under this condition, the MRL of the system is de…ned and several properties of that are derived. In section 3, under the assu...

Monadic second-order logic (MSOL) provides a general framework for expressing properties of reactive systems as modelled by trees. Monadic path logic (MPL) is obtained by restricting second-order quantification to paths reflecting computation sequences. In this paper we show that the expressive power of MPL over trees coincides with the usual branching time logic CTL∗ embellished with a simple ...

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...

We use a combination of several different types of lithography to generate Bragg-grating devices. In interference lithography, two coherent laser beams are crossed, generating a standing-wave interference pattern. This standing-wave pattern is used to expose photoresist, yielding a coherent deep-submicron-period grating. This grating can be used directly as the device grating or it can serve as...