نتایج جستجو برای: enhanced atomic layer deposition
تعداد نتایج: 767218 فیلتر نتایج به سال:
Tungsten oxide–silicon dioxide (WOx–SiOy) composite thin films were deposited for the first time via remote oxygen plasma-enhanced atomic layer deposition (ALD) process using a novel metal-organic heteronuclear and heteroleptic precursor, bis(tert-butylimido)bis(trimethylsilylmethyl)tungsten. Self-limiting ALD growth was demonstrated over wide temperature window of 203–328 °C with per cycle dec...
A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it po...
We demonstrate a selective atomic layer deposition of TiO2 thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. The patterned monolayers define and direct the selective deposition of the TiO2 thin film using atomic layer deposition. The selective atomic layer deposition is based on ...
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