Nanostructuring for tailored optical functionality suffers from a lack of methods for large-area and low-cost fabrication. While electron beam lithography allows different complex shapes to be deposited onto the same substrate layer, the writing process is sequential and the fabrication is very expensive. Large-area methods, such as nanosphere lithography, [ 1 ] colloidal lithography using shad...

Lithography using photomasks has been the major workhorse in printed circuit boards, semiconductors, and flat panel display device manufacturing. However, the cost of photomask is so high that it often becomes the bottleneck, especially when the production volume is low. Recently, maskless lithography technology is gaining more attention, and hence, the computation of efficient lithography path...

The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing....

This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based UV exposure system for photolithography. The major system components include UV-LEDs, microcontroller, digital-to-analog (D/A) converter and LED control circuitry. The UV-LED lithography system is also equipped with a digital user interface (LCD and keypad) and permits accurate electronic control on the...

UNLABELLED Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands...

The VLSI placement problem is to place the objects into fixed die such that there are no overlaps among the objects and some cost metric such as wire length and routability is optimized. For this purpose A new routing method is used called , A Deep sub-wavelength lithography, (using the 193nm lithography to print 45nm, 32nm, and possibly 22nm integrated circuits), is one of the most fundamental...

Wim Bogaerts, Vincent Wiaux*, Dirk Taillaert, Stephan Beckx*, Roel Baets Ghent University-IMEC, Dept. of Information Technology, Sint-Pietersnieuwstraat 41, 9000 Gent, Belgium * IMEC vzw, Silicon Process Technology Division, Kapeldreef 75, B-3001 Leuven, Belgium Tel: (32) 9 264 3446, Fax: (32) 9264 3593 , e-mail: [email protected] ABSTRACT We demonstrate the use of deep UV lithograph...

Nucleotide arrays require controlled surface densities and minimal nucleotide-substrate interactions to enable highly specific and efficient recognition by corresponding targets. We investigated chemical lift-off lithography with hydroxyl- and oligo(ethylene glycol)-terminated alkanethiol self-assembled monolayers as a means to produce substrates optimized for tethered DNA insertion into post-l...

Flow lithography has become a powerful particle synthesis technique. Currently, flow lithography relies on the use of polydimethylsiloxane microchannels, because the process requires local inhibition of polymerization, near channel interfaces, via oxygen permeation. The dependence on polydimethylsiloxane devices greatly limits the range of precursor materials that can be processed in flow litho...

Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated. Nanoimprint lithography has demonstrated 10 nm feature size, 40 nm pitch, vertical and smooth sidewalls, and nearly 90 ° corners. Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be su...