نتایج جستجو برای: enhanced atomic layer deposition
تعداد نتایج: 767218 فیلتر نتایج به سال:
Journal:
:Materials
2015
Journal:
:Coatings
2021
Ruthenium thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) technology using Ru(EtCp)2 and oxygen plasma on the modified surface of silicon SiO2/Si substrates. The crystal structure, chemical composition, morphology characterized grazing incidence XRD (GXRD), secondary ion mass spectrometry (SIMS), force microscopy (AFM) techniques, respectively. It was found that mec...
Journal:
:Journal of Vacuum Science & Technology A
2020
Journal:
:Nanoscale Research Letters
2013
Journal:
:Journal of the Korean Vacuum Society
2010
Journal:
:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
2012
2008
MÅRTEN ROOTH
Mårten Rooth
Anders Johansson
Mats Boman
Kaupo Kukli
Jaan Aarik
Ronald A. Quinlan
Erika Widenkvist
Jun Lu
Helena Grennberg
Brian C. Holloway
Journal:
:Journal of Vacuum Science & Technology A
2020
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