We report an interesting observation of minimization of bacterial attachment on titanium nitride coatings of increased thickness. DC magnetron sputtering method was used to prepare titanium nitride coatings of different thickness and the attachment of an oral bacteria Porphyromonas gingivalis was studied. With increase in thickness of the coatings the particle size increased and the order of ba...

Infrared optical properties of mixed-phase thin films studied by spectroscopic ellipsometry using boron nitride as an example" (1997). We present a microstructure-dependent anisotropic infrared-optical dielectric function model for mixed-phase polycrystalline material from which we derive the transverse and longitudinal-optical modes observable in thin films. Infrared ellipsometry over the wave...

Wurzite aluminum nitride is prepared on a c-plane sapphire substrate by electron cyclotron resonance plasma-enhanced sputtering deposition (ECR sputtering). Atomic force microscopy (AFM) showed flat AlN thin-film surfaces, and X-ray diffraction (XRD) analysis verified the epitaxial growth of AlN films with the full-width at half-maximum (FWHM) of the rocking curve of 0.025 deg on the film with ...

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...

Aluminium nitride is a promising coating material for many applications, due to its good physical and mechanical properties. Hard transparent Aluminium nitride thin films have been deposited by bipolar reactive pulsed magnetron sputtering (PMS). With its inherent advantages of energetic particle bombardment of the growing film and minimal arcing tendency even in dielectric layer deposition proc...

Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers, glass and Ti6Al4V substrates. The film deposition was carried out in a gas mixture of Ar N2. nitrogen content varied between 0 30 % the total mixture. This variation led to formation different with microstructures. microstructure Ti-N coatings presented nanocomposites low tendency surface oxidation. From ...

An integrated humidity sensor system with nano-structured carbon nitride film as humidity sensing material is fabricated by a 0.8 μm analog mixed CMOS process. The integrated sensor system consists of differential humidity sensitive field effect transistors (HUSFET), temperature sensor, and operational amplifier. The process contains two poly, two metal and twin well technology. To form CNx fil...

Bismuth titanate (Bi,Ti,O,, :BIT) thin films were prepared on the Pt courted MgO(100) substrate by electron cyclotron resonance plasma sputtering-chemical vapor deposition (ECR plasma sputtering-CVD). Bi20, was used as a sputtering target and tetra-isopropoxy-titanium [Ti(i-C3H70)4] as a CVD source. The composition of films was controlled by changing RF power (P,,) of Bi,O, target and Ti source...

Nanocrystalline TiN has been imbedded in amorphous silicon nitride matrix to form a super hard nanocomposite thin film (ncTiNya-SiN ) via magnetron sputtering. Adjusting Ti and Si N target power ratio altered film composition, size, amount and x 3 4 distribution of the nc-TiN phase. At a Ti target power density of 5.5 W cm , the Ti to Si N target power ratio should be greater y2 3 4 than unity ...