a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...

We report the first results of functional properties of nitrogenized silver-permalloy thin films deposited on polyethylene terephthalic ester {PETE (C10H₈O₄)n} flexible substrates by magnetron sputtering. These new soft magnetic thin films have magnetization that is comparable to pure Ni81Fe19 permalloy films. Two target compositions (Ni76Fe19Ag₅ and Ni72Fe18Ag10) were used to study the effect ...

In this work, silicon nitride (Si3N4) thin films were deposited on metallic substrates (aluminium and titanium sheets) by the DC reactive sputtering technique using two different targets (n-type p-type Si wafers) as well Ar:N2 gas mixing ratios (50:50 70:30). The electrical conductivity of titanium) was measured before after deposition both surfaces substrates. results obtained from work showed...

Abstract We present a comprehensive study of molybdenum nitride (MoN) thin film deposition using direct current reactive magnetron sputtering. have investigated the effect various conditions on superconducting and electrical properties films. Furthermore, we shown that meander-shaped single-photon detectors made from 5 nm MoN films saturated quantum detection efficiency at telecom wavelength 15...

Thin films composed of titanium nitride doped with silver were deposited by DC reactive sputtering, with Ag contents varying between 0 and 50 at.%. The as-deposited samples were subjected to vacuum annealing treatments, with a range of temperatures varying from 200 to 500°C, in order to study the morphological and structural changes that may occur. The as-deposited samples showed three main zon...

In this thesis I made a study of the properties of reactively sputtered ultra-thin films of niobium nitride (NbN) and niobium titanium nitride (NbTiN). Using Variable Angle Spectral Ellipsometry (VASE), I found that the optical properties of NbN films appear to have a critical thickness above which the optical parameters stabilize. I also found that the deposition process has better stability o...

In this paper, we report the realization and characterization of a condensation sensor based on indium nitride (InN) layers deposited by magnetron sputtering on glass and flexible plastic substrates, having fast response and using potentially low cost fabrication technology. The InN devices work as open gate thin film sensitive transistors. Condensed water droplets, formed on the open gate regi...

Study of Aluminum nitride (AlN) thin film deposited on silicon wafer and glass substrates by DC magnetron sputtering technique at different power variation. The X-ray diffraction and Fourier transform infrared spectroscopy (FTIR) study revealed the formation of the AlN phase. The optical characteristics of films, such as refractiveindex, extinction coefficient, and average thickness, were calcu...