Holographic methods utilizing spatial modulators to supplant the covers in photolithographic process. PC produced 3D images got from two pictures with known measurements, reproducing a clear visible field Mask and dark prior mask. The reason for proposal is consider potential outcomes of picture decrease, through holographic based optical segment arrangement, by CGH (Computer-created Hologram)....

Abstract Due to the precision and sizing requirements of popular semiconductor devices nowadays, thickness control uniformity optimization photoresist during photolithography process are thought be critical issues for engineers consider. In this paper, parameters affecting thoroughly analyzed an economic novel approach improving spin coating is presented. Integrated Nanosystems Research Facilit...

Abstract A new, scalable process chain for the fabrication of curved micro-structured metallic tools is developed and evaluated. Arrays arrows, circles, semicircles rings with final lateral dimensions 124 to 819 µm are realised on successfully transmitted in one step stainless steel workpieces a functional area 6.5 cm 2 using pulsed electrochemical machining. Photolithography-etching or micromi...

The Photolithography Advisor is a program for the diagnosis and correction of negative resist photolithography defects occurring during integrated circuit fabrication. Given a set of observed symptoms on a wafer, the Advisor diagnoses defects due to these symptoms and recommends corrective action for each. An early prototype of the program was tested in a research lab, where experimental ICs we...

A novel process based on the principle of layered photolithography has been proposed and tested for making three-dimensional micro-structures. An experimental setup was designed and built for doing experiments on this micro-fabrication process. An ultraviolet (UV) excimer laser at the wavelength of 248 nm was used as the light source and a single piece of photo-mask carrying a series of two dim...