The synthesis of singleand double-wall carbon nanotubes by gas flow-modified, catalyst-supported chemical vapor deposition (CCVD) is reported. We have investigated the gas flow condition dependence on the synthesis of carbon nanotubes (CNTs) by placing blocks in the CCVD reactor. Carbon nanotubes having large diameters are preferentially grown under turbulent flow conditions. This indicates tha...

In this work optical properties of SiOX ð0 , X , 2Þ layers obtained by plasma enhanced chemical vapor deposition are studied. Infrared spectra and refractive index dependences with the reactant gases flow ratio R are explained for as deposited, aged and thermally treated samples in the R range from 9.17 to 110. Variations are found to be influenced mainly by sample stoichiometry, density and Si...

The study of chemical reaction rates or “chemical kinetics” is fundamental to the study of chemistry itself and is intimately connected as well to life’s biochemical and biological processes. Most chemical reactions proceed by a complex mechanism that involves a series of elementary steps and it is often the role of chemical kinetics studies to identify these steps, with one typically expected ...

While the traditional and popular realm of polymer synthesis is the liquid phase, the use of vapor-based techniques to deposit polymers has been met with increasing interest over the past decades. The perhaps most relevant example, the deposition of poly(p-xylylenes) via the Gorham process, has been of industrial use in the fabrication of isolating or protective coatings in electronics and biom...

Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...

We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...