Characterization was performed on 60 nm +/3 nm films of atomic layer deposition (ALD) hafnium dioxide (HfO2) and aluminum oxide (Al2O3), and plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (Si3N4) as MIM capacitor dielectric for GaAs HBT technology. The capacitance density of MIM capacitor with ALD HfO2 (2.73 fF/m 2 ) and Al2O3 (1.55 fF/m 2 ) is significantly higher than tha...

Diamond-like carbon (DLC) is a metastable form of amorphous carbon having large sp 3 bonding. DLC films have unique properties such as high hardness, low-friction, good transparency in IR region, chemical inertness and biocompatibility. To have better performance of the coating one should have proper selection of different parameters for deposition. In the present study, DLC films were deposite...

In silicon heterojunction solar cells, the passivation of the crystalline silicon wafer surfaces and fabrication of emitter and back surface field are all performed by intrinsic and doped amorphous silicon thin layers, usually deposited by plasma-enhanced chemical vapor deposition (PECVD). By using in-situ diagnostics during PECVD, it is found that the passivation quality of such layers directl...

Vertical graphene (VG) sheets were single-step synthesized via inductively coupled plasma (ICP)-enhanced chemical vapor deposition (PECVD) using waste lard oil as a sustainable and economical carbon source. Interweaved few-layer VG sheets, H₂, and other hydrocarbon gases were obtained after the decomposition of waste lard oil. The influence of parameters such as temperature, gas proportion, ICP...

Photocatalytic properties of semiconductor materials, studied now for decades, represent huge potentialities as environmentally friendly self-cleaning surfaces. Up to now, inexpensive and non-toxic TiO2-based photocatalysts remain the most interesting solution from practical industrial point view. Nevertheless, obtaining titania surface in its anatase phase, polymorph presenting best photocatal...

Aligned carbon nanotubes have been grown using microwave plasma enhanced chemical vapor deposition (PECVD). The carbon nanotubes are nucleated from iron catalyst particles which, during growth, remain adherent to the silicon substrates. By analysis with high-resolution electron microscopy, we observe iron silicide roots penetrating into the silicon substrate at the interface of the catalyst par...

Characterization was performed on the application of atomic layer deposition (ALD) of hafnium dioxide (HfO2) and aluminum oxide (Al2O3), and plasma-enhanced chemical vapor deposition (PECVD) of silicon nitride (Si3N4) as metal–insulator–metal (MIM) capacitor dielectric for GaAs heterojunction bipolar transistor (HBT) technology. The results show that the MIM capacitor with 62 nm of ALD HfO2 res...

Electrospray is the technique to soft-ionize liquids by applying a high electric potential to a liquid meniscus. The liquid meniscus is deformed into a cone [1], and charged species are emitted from its apex. The emission can be solvated ions, charged droplets, or a mix of the two. This low-divergence charged species source can be used in diverse applications such as mass spectrometry, propulsi...

Solar cells based on epitaxial silicon layers as the absorber attract increasing attention because of the potential cost reduction. In this work, we studied the influence of the deposition rate on the structural properties of epitaxial silicon layers produced by plasma-enhanced chemical vapor deposition (epi-PECVD) using silane as a precursor and hydrogen as a carrier gas. We found that the cry...