Field emission properties of carbon black, carbon black and silica, and diesel engine exhaust were investigated and compared to multiwall carbon nanotubes prepared in a similar manner. Sample preparation consisted of pressing the nanopowders into pellet form, dispersing them in isopropanol, or dispersing them in Shipley S1818 photoresist to achieve better adhesion to the substrates. Turn-on fie...

We report a simple and inexpensive approach to the fabrication of enclosed nanoscale channels composed of silica nanoparticles on planar Si surfaces using interferometric lithography to define the long-range pattern in a photoresist film followed by spin-coating self-assembly of colloidal silica nanoparticles and high-temperature calcination to remove the photoresist leaving open nanochannels. ...

A great deal of photolithographic activity in recent years has been centered on thick photoresist films. Thin film heads (TFH), micromachining and sensor fabrication are examples of applications requiring this type of processing. The needs of the TFH industry are currently the technology driver for thick photoresist processing. Modern TFH manufacturing processes require 1 μm resolution in layer...

The paper presents a new silicon wafer bonding technique. The high-resolution bonding pad is defined through photolithography process. Photosensitive materials with patternable characteristics are served as the adhesive intermediate bonding layer between the silicon wafers. Several types of photosensitive materials such as SU-8 (negative photoresist), AZ-4620 (positive photoresist), SP341 (poly...

Using a simple theoretical model, we calculate three-dimensional profiles of photoresist exposed by arbitrarily shaped localized fields of high-transmission metal nano-apertures. We apply the finite difference time domain (FDTD) method to obtain the localized field distributions, which are generated by excitation of localized surface plasmon polaritons underneath a C-shaped or a bow-tie-shaped ...

An achromatic interferometer was developed to produce 1200-lines/mm crossed-line photoresist gratings with a mercury arc light source. It is a compact reflection system of outstanding stability. Alignment procedures are described. The most stringent requirement, coplanar alignment of two folding gratings, was accomplished with the aid of a Twyman-Green interferometer. The grating interferometer...

NSF SBIR program supports a collaborative research and development effort between UCLA and Surfx Technologies LLC. This paper discusses the benefits of participation in the NSF SBIR Phase II research on "Environmentally Benign, High Pressure Plasma Cleaning Tool for Photoresists." Specifically, this research aims to commercialize an atmospheric plasma processing system for photoresist ashing an...

This paper presents a simple and effective method to fabricate a polydimethyl-siloxane (PDMS) microlens array with a high fill factor, which utilizes the UV proximity printing and photoresist replication methods. The concave microlens array mold was made using a printing gap in lithography process, which utilizes optical diffraction of UV light to deflect away from the aperture edges and produc...

We previously developed an all-in-one photopolymerization device by modifying a commercially available liquid crystal display projector (LCDP) for the preparation of micropatterned surfaces and microfluidic channels without the need for expensive photomasks. In the present study, we demonstrate a simple and reliable method for rapid prototyping of cell micropatterning with high resolution using...