Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensibleness and technical feasibility. Examples under consideration include design-for-manufacturability and invers...

We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprin...

In the first part of present article, important and main methods photolithography are reviewed discussed. Then we introduce ways to improve images created on photoresist, which is material lithography. Lithography with high-energy particle soft lithography then described. second part, contact-photolithography method its improvement process, use in our laboratory, introduced described detail. We...

We describe a numerical model for chip level lithography variability analysis. Gate level critical dimensions are adjusted based on lithographic variability simulations and these perturbed gate lengths are input to a chip timing analyzer. Statistical modeling studies highlight the interaction between lithography variability and chip timing performance including the role of lithography error cor...

Stereo-lithography is a distinctive form of technology which permits for the translation of computer aided design illustration to3D solid items within hours. In Stereo-lithography melted plastic is solidified in particular patterns by laser beam consequential in solid epoxy realization of a 3D project. This ultraviolet laser beam is directed by CAD data. Parts created using Stereo Lithography m...

As technology nodes continue to shrink, layout patterns become more sensitive to lithography processes, resulting in lithography hotspots that need to be identified and eliminated during physical verification. We propose an accurate hotspot detection approach based on principal component analysis-support vector machine classifier. Several techniques, including hierarchical data clustering, data...

Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...

As technology nodes continues shrinking, layout patterns become more sensitive to lithography processes, resulting in lithography hotspots that need to be identified and eliminated during physical verification. In this paper, we propose an accurate hotspot detection approach based on PCA (principle component analysis)-SVM (support vector machine) classifier. Several techniques, including hierar...

Articles you may be interested in In situ cycling and mechanical testing of silicon nanowire anodes for lithium-ion battery applications Appl. Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography Sub-200 nm gap electrodes by soft UV nanoimprint lithography using polydimethyl...