In this work optical properties of SiOX ð0 , X , 2Þ layers obtained by plasma enhanced chemical vapor deposition are studied. Infrared spectra and refractive index dependences with the reactant gases flow ratio R are explained for as deposited, aged and thermally treated samples in the R range from 9.17 to 110. Variations are found to be influenced mainly by sample stoichiometry, density and Si...

Silicon nanowires with high aspect ratio were grown using PPECVD and a gold catalyst on a variety of different substrates. The morphology of the nanowires was investigated for a range of crystalline silicon, glass, metal, ITO coated and amorphous silicon coated glass substrates. Deposition of the nanowires was carried out in a parallel plate PECVD chamber modified for PPECVD using a 1kHz square...

Low refractive index Silicon Oxynitride (SiON) layers were deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) using SiH4/N2 and N2O. At an index less than 1.473 the as-deposited layers appeared to be unstable in time and sensitive to moisture as could be observed by a spectroscopic ellipsometer. The stability, probably due to partly open structures, could be improved by deposition a...

Recently, there has been growing interest in the incorporation of particles plasma deposited thin films to creation multifunctional surfaces. In this work a new hybrid methodology based on enhanced chemical vapor deposition (PECVD) hexamethyldisiloxane combined reactive sputtering TiO2 is proposed for preparation SiOxCyHz-TiO2 composite films. Specifically, effect proportion O2 environment morp...

Barrier layer material deposited on stainless steel substrate has been under investigation. These layers are part of a film-Si module, presently under development at ECN. Low temperature (< 250°C) processing is required in order to avoid impurity diffusion from the stainless steel foil. Novel materials based on nano particles combined with organic/ inorganic polymers and SiOx precipitated from ...