Silicon nitride thin films were prepared by reactive sputtering from different sputtering targets and using a range of Ar/N2 sputtering gas mixtures. The hardness and the Young’s modulus of the samples were determined by nanoindentation measurements. Depending on the preparation parameters, the obtained values were in the ranges 8–23 and 100–210 GPa, respectively. Additionally, Fourier-transfor...

Titanium nitride thin films were grown on 304 stainless steel substrates at various nitrogen/argon flow ratios by ion beam sputtering (IBS) technique. The current research is a follow up study on the influence of gas ratio on structural and corrosion properties in the TiN coated 304 stainless steel. Film structural identification of phases was performed using X-ray diffractometry (XRD). Sca...

A novel design electroplating spring frame MEMS structure specimen is demonstrated here. The specimen can be fit into a specially designed microtensile apparatus which is capable of carrying out a series of tests on submicro scale freestanding thin films. Certain thin films applicable in MEMS were tested including sputtered Chrome, Nicole, Copper, Tantalum Nitride thin films. Metal specimens we...

Alternative materials for plasmonic devices have garnered much recent interest. A promising candidate material is titanium nitride. Although there is a substantial body of work on the formation of this material, its use for plasmonic applications requires a more systematic and detailed optical analysis than has previously been carried out. This paper describes an initial optimization of sputter...

Ultrasonic force microscopy has been applied to the characterization of titanium nitride coatings deposited by physical vapor deposition dc magnetron sputtering on stainless steel substrates. The titanium nitride layers exhibit a rich variety of elastic contrast in the ultrasonic force microscopy images. Nanoscale inhomogeneities in stiffness on the titanium nitride films have been attributed t...

I Abstract The present thesis focuses on carbon-based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Carbon nitride (CN x : 0 < x < 0.20) as well as carbon fluoride (CF x : 0.04 < x < 0.35) thin films were synthesized in an industrial deposition chamber by reactive magnetron sputtering of graphite in Ne/N 2 , Ar/N 2 , Kr/N...

We have studied optical, chemical and structural properties of Zirconium Nitride thin films as reflecting back contact in solar cell application by reactive sputtering method with different applied bias voltage. The properties of back contact reflector are higher reflection at longer wavelength, resistivity, chemical stability and barrier properties for diffusion of impurities etc., Here, ZrN t...

The scope of this licentiate thesis is the investigation of carbon based thin films suitable for rolling components, especially roller bearings. Carbon and carbon nitride are materials with advantageous tribological properties and high resiliency. Such materials are required in order to withstand the demanding conditions of bearing operation, such as high loads and corrosive environments. A fun...

Thin film coatings are used to reduce the generation of secondary electrons at the ends of the Advanced Photon Source (APS) rf cavity tuners because these electrons result in increased temperatures on the tuner. To improve the film properties over the existing evaporated titanium film, a magnetron-sputtered film of titanium nitride has been developed that is both harder and adheres more strongl...