Despite high interest for novel device applications, alignment and electrical integration of nanowires to lithographically defined features remains a challenge. In this work, ZnO nanowire devices were fabricated using a novel carbonized photoresist method in which photoresist is lithographically patterned, carbonized at elevated temperature, and then used to selectively seed growth of ZnO nanob...

This paper describes a simple method for the microfabrication of mechanically compliant, magnetically-responsive microstructures. These microstructures were fabricated in one step by using a ferromagnetic photoresist, which, in turn, was prepared by suspending nickel nanospheres in a negative photosensitive epoxy (SU8). The nominal diameter of the nickel nanospheres was 80–150 nm, that is, much...

It is of great value to develop a simple, controllable, and scalable method of making superamphiphobic surfaces. Here we present a facile one-step photolithographic method to engineer superamphiphobic surfaces consisting of photoresist micropillars decorated with nanoparticles of the same photoresist. The surface or coating is optically transparent and versatile, and can be fabricated on a broa...

A semi-empirical study into the effects of residual casting solvent on the lithographic properties of photoresist is described. Solvent content of a commercial i-line photoresist after post apply bake has been measured using a quartz crystal microbalance and using radio-labeled solvent with scintillation counting. Analysis of this data has led to a calibrated model of solvent diffusivity as a f...

A system of in situ ultrasonic sensors has been developed that can be used to monitor the photoresist prebake process. A high frequency phase measurement monitors the resist film properties while a lower frequency time of flight measurement monitors the corresponding wafer temperature. The high frequency measurement involves calculating the phase of an ultrasound signal as it is reflected from ...

A technique for resist deposition using a novel fluid ejection method is presented in this paper. An ejector has been developed to deposit photoresist on silicon wafers without spinning. Drop-on-demand coating of the wafer reduces waste and the cost of coating wafers. Shipley 1400-21, 1400-27, 1805, and 1813 resists were used to coat sample 3and 4-in wafers. Later, these wafers were exposed and...

This paper describes the fabrication of arrays of spherical microlenses by self-assembly of microspheres and the use of these arrays for nearfield photolithography to generate repetitive microstructures in photoresist. We used these arrays of microspheres to fabricate two types of elastomeric membranes: (i) membranes that have microspheres embedded in their surface and (ii) membranes that have ...

Ultra-precision products which contain a micro-hole array have recently shown remarkable demand growth in many fields, especially in the semiconductor and display industries. Photoresist etching and electrochemical machining are widely known as precision methods for machining micro-holes with no residual stress and lower surface roughness on the fabricated products. The Invar shadow masks used ...

Solar energy has emerged as an inexpensive and powerful means for clean energy production and draws much research interest. In particular, thinfilm solar cells often rely on the use of permanent shadow masks to pattern their front metal contacts for energy transport. However, these machined masks are not adjustable, and currently limit the scope of experimentation. In addition, the essence of f...

After coating, the resist film contains a remaining solvent concentration depending on the resist, the solvent, the resist film thickness and the resist coating technique. The softbake reduces the remaining solvent content in order to: avoid mask contamination and/or sticking to the mask, prevent popping or foaming of the resist by N2 created during exposure, improve resist adhesion to the subs...