نتایج جستجو برای: photolithography

تعداد نتایج: 1452  

Journal: :Analytical chemistry 2002
Hongkai Wu Teri W Odom George M Whitesides

This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of approximately 2 x 2 cm2. The simple optical configu...

2014
H. Kirchauer S. Selberherr

A key step in photolithography simulation is a rigorous three-dimensional modeling of the exposure/bleaching of the resist's photoactive compound (PAC). Thereby electromagnetic (EM) scattering of light caused by the nonlinear resist as well as by a nonplanar topography has to be considered. We present a novel three-dimensional approach, based on a numerical solution of the Maxwell equations. Fu...

Journal: :Journal of the Surface Finishing Society of Japan 1995

2016
Reinhard Voelkel

Photolithography is the engine that empowered semiconductor industry to reduce the minimum feature size of the components of a microchip from some 50 microns in the 1960s to below 14 nanometers today. Diffractive and refractive micro-optical components play a decisive role in modern photolithography systems, e.g. for laser line width narrowing, laser beam shaping (customized illumination), as p...

2006
Arthur M. D. Shr Alan Liu Peter P. Chen

The dedicated photolithography machine constraint in semiconductor manufacturing is one of the new issues of photolithography machinery due to natural bias. In this paper, we propose the heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) to tackle this constraint. The LB method is to schedule each wafer lot at the first photolithography st...

Journal: :Journal of Optics B: Quantum and Semiclassical Optics 2003

2011
Seung-Hyun Park Jung-Ah Shin Hyun-Hee Park Gwang Yong Yi Kwang-Jae Chung Hae-Dong Park Kab-Bae Kim In-Seop Lee

OBJECTIVES The purpose of this study was to measure the concentration of volatile organic compound (VOC)s originated from the chemicals used and/or derived from the original parental chemicals in the photolithography processes of semiconductor manufacturing factories. METHODS A total of four photolithography processes in 4 Fabs at three different semiconductor manufacturing factories in Korea...

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