Vertical graphene (VG) sheets were single-step synthesized via inductively coupled plasma (ICP)-enhanced chemical vapor deposition (PECVD) using waste lard oil as a sustainable and economical carbon source. Interweaved few-layer VG sheets, H₂, and other hydrocarbon gases were obtained after the decomposition of waste lard oil. The influence of parameters such as temperature, gas proportion, ICP...

Aligned carbon nanotubes have been grown using microwave plasma enhanced chemical vapor deposition (PECVD). The carbon nanotubes are nucleated from iron catalyst particles which, during growth, remain adherent to the silicon substrates. By analysis with high-resolution electron microscopy, we observe iron silicide roots penetrating into the silicon substrate at the interface of the catalyst par...

Characterization was performed on the application of atomic layer deposition (ALD) of hafnium dioxide (HfO2) and aluminum oxide (Al2O3), and plasma-enhanced chemical vapor deposition (PECVD) of silicon nitride (Si3N4) as metal–insulator–metal (MIM) capacitor dielectric for GaAs heterojunction bipolar transistor (HBT) technology. The results show that the MIM capacitor with 62 nm of ALD HfO2 res...

Electrospray is the technique to soft-ionize liquids by applying a high electric potential to a liquid meniscus. The liquid meniscus is deformed into a cone [1], and charged species are emitted from its apex. The emission can be solvated ions, charged droplets, or a mix of the two. This low-divergence charged species source can be used in diverse applications such as mass spectrometry, propulsi...

Solar cells based on epitaxial silicon layers as the absorber attract increasing attention because of the potential cost reduction. In this work, we studied the influence of the deposition rate on the structural properties of epitaxial silicon layers produced by plasma-enhanced chemical vapor deposition (epi-PECVD) using silane as a precursor and hydrogen as a carrier gas. We found that the cry...

This paper gives some insights in the applications where PECVD nitrides can be introduced to replace the LPCVD layers and how the process parameters need to be varied to obtain the desired properties. Film properties like stress, hydrogen content, wet etch rate and deposition rate are reported. The nitrides are optimized for specific applications and examples on the influence of nitride propert...

Introduction Silicon oxynitride is a flexible material for use as planar optical waveguides because by changing the composition ( O N ratio) the refractive index can be tuned from 1.46 to 2.0'. Several methods can be used for deposition: PECVD, LPCVD and sputtering. The advantages of PECVD are easy control of composition, high deposition rate and low stress. A disadvantage is the high hydrogen ...

The introduction of new in situ sensing creates the possibility of directly controlling critical process variables in plasma enhanced chemical vapor deposition systems (PECVD). The complexity of this process makes it necessary to develop empirical models of the system dynamics. This paper describes the experimental and numerical procedures for identifying both transfer function and recurrent ne...

The wavelength selective linear absorption in communication C-band is investigated in CMOS-processed PECVD silicon nitride rings. In the overcoupled region, the linear absorption loss lowers the on-resonance transmission of a ring resonator and increases its overall quality factor. Both the linear absorption and ring quality factor are maximized near 1520 nm. The direct heating by phonon absorp...

High-quality single-walled carbon nanotubes (SWCNTs) have been synthesized from H2–CH4 mixtures on a MgO-supported bimetallic Mo/Co catalyst using microwave plasma-enhanced chemical vapor deposition (PECVD). Reaction parameters including temperature, H2:CH4 ratio, plasma power, and synthesis time have been examined to assess their influence on SWCNT synthesis. Raman spectroscopy and high-resolu...