The suitability of three vapor deposition techniques for pore size modification was evaluated using polycarbonate track etched membranes as model supports. A feature scale model was employed to predict the pore geometry after modification and the resulting pure water flux. Physical vapor deposition (PVD) and pulsed plasma-enhanced chemical vapor deposition (PECVD), naturally, form asymmetric na...

ZnS/glass Thinlayer in high vacuum condition and $40$ degree‎ ‎Deposition angle has been produced by resistance evaporated method ‎with $28$ nm thickness‎. ‎cabin deposition temperature ZnS layer was‎ ‎about $50C$ and substrates were kept at room temperature‎. ‎The Atomic ‎Force Microscopy (AFM) and XRD analyses are perfectly accomplished‎ ‎for this layer.‎‎‎