It is necessary to study the optical properties of thin films to fabricate optoelectronic and interference devices. One of the methods in thin film preparation is the spray pyrolysis technique, which involves many technical aspects for the preparation of uniform coating. In the present study, Nickel Oxide (NiO) thin film is prepared by spray pyrolysis technique. NiO thin film was deposited usin...

In this article, we report an alternative method for in situ monitoring of the thickness and refractive index of thin film during the growth process. We design a special structure with a thickness-controlled air film to simulate the process of thin film growth. The phase term of the reflected light coming from this multi-layer structure is modulated and has a strong correlation with the thickne...

This paper reports the correlation between film thickness, nanostructure and DC electrical properties of copper thin films deposited by PVD method on glass substrate. X-ray diffraction (XRD) and atomic force microscopy (AFM) were used for crystallography and morphology investigation, respectively. Resistivity was measured by four point probe instrument, while a Hall effects measurement system w...

A novel Zr,Ce-TiO2/SiO2 nanocomposite thin film was successfully prepared with various amounts of Zr4+ and Ce4+ as codopant ions for self-cleaning applications. A thin film was coated on a tile substrate by dip-coating and porous Zr,Ce-TiO2/SiO2 was obtained after heat treatment for 2 hours at 500 °C. The SEM images an...

A high flux thin-film nanocomposite membrane epoxy/ zeolite NaA nanocomposite films prepared by using ultrasonic mixing and spin coating. The synthesized nanocomposites film was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), thermal gravity analysis (TGA), and FTIR spectroscopy. Water softener and water flux characteristics of the epoxy/ zeolite NaA nanocomposite ...

This paper presents a unique optical technique that utilizes the reabsorption and emission of two fluorescent dyes to accurately measure film thickness while minimizing errors caused by variations in illumination intensity and surface reflectivity. Combinations of dyes are selected that exhibit a high degree of emission reabsorption and each dye concentration is adjusted to create an optically ...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

A thin-film transistor (TFT) having an organic-inorganic hybrid thin film combines the advantage of TFT sensors and the enhanced sensing performance of hybrid materials. In this work, poly(3-hexylthiophene) (P3HT)-zinc oxide (ZnO) nanoparticles' hybrid thin film was fabricated by a spraying process as the active layer of TFT for the employment of a room temperature operated formaldehyde (HCHO) ...

This paper reports the results of electrical characterization of aluminum thin films. Uniform Al thin films were deposited by physical vapor deposition (PVD) technique on glass substrates. The electrical resistivity of the films as a function of film thickness was studied. These parameters have been measured by four-point probe method. The electrical resistivity was obtained by the measurement ...