Photoactivated orientation of gold nanorods (AuNRs) incorporated into polymethylmethacrylate and SU-8 photoresist films occurs under red light activation. Excitation of the longitudinal surface plasmon resonance band leads to selective orientation of the nanostructures, revealed by a change in the absorption spectra.

We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions a...

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.

Catalyst-free growth of a nanocrystalline few-layer graphene (or graphite) film from photoresist on variable substrates was demonstrated. The thickness of the film can be easily controlled from 1 nm to hundreds of nanometers. With this method, graphene/graphite patterns with different thicknesses have been designed for integrated electronics.