Lithography hotspot detection faces three challenges: 1) real hotspots are now harder to fix; 2) false alarm rate must be minimized; 3), full chip physical verification and optimization require fast turnaround. We propose a lithographic hotspot detection flow with ultra-fast speed and high fidelity that is especially suitable for guiding lithography-friendly design under real manufacturing cond...

Perovskite-Compatible Transparent Nanostencil Lithography In article number 2300570, Hsien-Yi Hsu, Bin Han, and co-workers develop a focused ion beam-assisted transparent stencil lithography for the fabrication of organic-inorganic hybrid perovskite nanodevices. The provides resolution down to 100 nm, along with high reusability. This technique can effectively support miniaturization integratio...

A direct-write maskless lithography system using 25nm for 50nm feature sizes requires data rates of about 10 Tb/s to maintain a throughput of one wafer per minute per layer achieved by today’s optical lithography systems. In a previous paper, we presented an architecture that achieves this data rate contingent on 25 to 1 compression of lithography data, and on implementation of a real-time deco...