Titanium nitride (TiN), a stable compound with the NaCl structure, has a wide range of properties which find applications in cutting tools, wear resistant parts, semiconductor metallization, and the jewelry industry. However, there are problems with preparing highly adhesive thin films which maintain good properties. Thin films of titanium nitride have been prepared by the Electron Shower (ES) ...

We investigated layered titanium nitride (TiN) and aluminum (AlN) for color glasses in building integrated photovoltaic (BIPV) systems. AlN TiN are among suitable cost-effective optical materials to be used as thin multilayer films, owing the significant difference their refractive index. To fabricate structure, we radio frequency magnetron deposition method achieve target thickness uniformly. ...

The structural and oxidation behavior of nanocomposite titanium chromium nitride (TiCrN) thin films has been investigated by using x-ray diffraction (XRD), energy dispersive spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM). TiCrN were deposited on Si substrates the reactive DC magnetron sputtering technique from Ti-Cr mosaic target. After that, as-deposited annealed in a...

Plasma-based ion implantation (PBII) is usually carried out with isotropic gaseous plasmas, such as a discharge in nitrogen. More recently, it has been applied using drifting plasmas, such as those produced by cathodic arcs, in order to allow efficient implantation of metallic species. The condensable nature of a cathodic arc plasma allows for the deposition of ion-stitched thin film coatings, ...

A major consideration in designing dental implants is the creation of a surface that provides strong attachment between the implant and bone, connective tissue, or epithelium. In addition, it is important to inhibit the adherence of oral bacteria on titanium surfaces exposed to the oral cavity to maintain plaque-free implants. Previous in vitro studies have shown that titanium implant surfaces ...

In this study, NiTi thin films were deposited on the glass and NaCl substrates by means of magnetron sputtering method. The influence of aging temperature, over the range 300-500 oC, on phase transformation and mechanical properties of the sputtered NiTi thin films were studied by differential scanning calorimetry (DSC) and nano-indentation assay, respectively. The DSC curves showed that the ag...

In the present work, the deposition and characterization of dielectric, piezoelectric, semiconductor and conductor films by RF diode / RF magnetron sputtering process for applications in MEMS fabrication have been reported. Thin films of silicon dioxide, silicon nitride, amorphous silicon, zinc oxide and lanthanum doped lead zirconate titanate (PLZT) were prepared by RF sputtering process and e...