We demonstrate a practical design and integration of multidirectional tilted UV lithography and microinjection molding for microstructure-based microfluidic devices. The previously reported undercut (or T-profile) problem of photoresist causes the imperfect mirror image duplication of the microstructures to the Ni mold. This issue inevitably leads to the unstable molds in the production of micr...

A method for the large-scale fabrication of patterned organic nanowire (NW) arrays is demonstrated by the use of laser interference patterning (LIP) in conjunction with inductively coupled plasma (ICP) etching. The NW arrays can be fabricated after a short ICP etching of periodic patterns produced through LIP. Arrays of NWs have been fabricated in UV-absorbent polymers, such as PET (polyethylen...

In article number 2201688, Dominic T. Meiers, Cordt Zollfrank, Georg von Freymann, and co-workers present a new photoresist which enables direct laser writing of rigid structures made from the monomeric unit chitin. addition, they demonstrate way to significantly increase speed by transferring sensitization effect one- two-photon absorption.

Micro-Light-Emitting Diode (μLED) displays are of increasing interest in applications which require extremely high resolutions such as virtual and alternate reality headsets. Most modern full-color μLED rely on red, green, blue (RGB) pixels based different material systems combined together a thin-film transistor back panel, costly process often has very poor yield. An alternative approach is t...

We demonstrate a straightforward surface micromachining process for the rapid prototyping of thin 'chip-edge' silicon microcantilevers protruding from edge silicon-on-insulator chip. The uses single photolithographic mask-with xenon difluoride used to both pattern and release them by etching part underlying wafer. During step, are protected combination photoresist buried dioxide. use common mic...

In these applications, a master surface relief is created by exposing photoresist through a suitably designed grayscaleintensity mask. Development of the resist produces a profiled surface according to the mask transmittance and exposure. Components can be replicated from this master by contact molding; this requires a release layer to insure the master and replicant can be separated without da...

A black layer coating for an aluminum-photoresist interface with a reflectance less than 0.1% for 413-nm, s-polarized light incident at 25 degrees is described. It is made of space-compatible materials, and its rms roughness is less than 15 A.

A new surface micromachining process for surface tension powered self-assembly of silicon-based microstructures is described. Mechanical parts are formed from bonded silicon-oninsulator material and rotated out-of-plane by melting photoresist pads at low temperature. Simple mechanisms that allow accurate control of the final angle are introduced and used to construct fixed 45 mirrors and scanni...

Dry film photoresist is used for creating microfluidic structures by sandwiching the patterned resist in between of two substrates. The technique is applied for creating hybrid biochips for dielectrophoretic cell manipulation. Multiple level lithography is demonstrated and biocompatibility of the resist is proven. Due to simple fabrication procedures the resist can be processed in a low-tech en...

Controlled postdevelopment heat treatment of the photoresist polymer used in the preparation of holographic gratings has been shown to enhance the diffraction efficiency of gratings and reduce the scattering losses. We prove this effect by analyzing the resonant reflection spectra of a waveguide grating and observing the reduction in the arc-shaped light scattering associated with the excitatio...