In this paper, ZnO thin film is deposited on slide glass substrate using the sol-gel process. Presenting well-defined orientation of ZnO thin films Nanostructure were obtained by dip coating of zinc acetate dihydrate, monoethanolamine (MEA), de-ionized water and isopropanol alcohol. The annealed ZnO thin films were transparent ca 85-90% in visible range with an absorption edges at about 375 nm....

Post-crystallization heat-treatment of metal-induced laterally crystallized polycrystalline silicon thin film using YAG solid-state laser is characterized. It is found that both the material quality and the TFT performance are related to the laser-treatment condition. The amorphous silicon fraction remaining in the polycrystalline thin film can be reduced and the performance of the thin-film tr...

A calcium fluoride thin film co-doped with Yb3+/Tm3+ was deposited on Si substrates by the spin-coating method using trifluoroacetic acid as a fluorine source. The scanning electron microscopy (SEM) image of the sample showed that a thin film with some cracks was formed. After annealing, the cracks disappeared, and the film became thinner. The roughness of the thin film was about 150 nm, which ...

Thermally induced film wrinkling is a fabrication and reliability challenge for thin-film stacks consisting of a compliant film capped by a stiffer film. The current understanding of film wrinkling is largely restricted to thin-film stacks on blanket substrates. An understanding of wrinkling in thin-film stacks on patterned substrates is of greater practical relevance to the microelectronic ind...

Localized radiative energy transfer from a near-field emitter to a magnetic thin film structure is investigated. A magnetic thin film stack is placed in the near-field of the plasmonic nanoantenna to utilize the evanescent mode coupling between the nanoantenna and magnetic thin film stack. A bow-tie nano-optical antenna is excited with a tightly focused beam of light to improve near-field radia...

Previous research on the laser damage resistance of thin films deposited by atomic layer deposition (ALD) is rare. In this work, the ALD process for thin film generation was investigated using different process parameters such as various precursor types and pulse duration. The laser-induced damage threshold (LIDT) was measured as a key property for thin films used as laser system components. Re...

Although highly valuable as an R&D tool, ALD is a rather slow and thus expensive fabrication method for growing fi lms on the order of 1 μm thick, posing a challenge to industrial scaleup. Hence, there is a need to transfer learnings from ALD to higher-throughput manufacturing techniques without compromising quality. We fi rst demonstrate the ease of phase purifi cation of commercial SnS powder...