In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) of silicon-based dielectric films, and of films of recent interest in the development of lower-dielectric-constant alternatives. Aspects relevant to the HDP CVD process and using the process to achieve interlevel insulation, gap filling, and planarization are discussed. Result...

An original dimensionless study of the pure evaporation and precipitation stages of a spray pyrolysis process has been performed. An estimation of he evaporation time is proposed and the influence of the main processing parameters has been investigated. For operating conditions corresponding o industrial requirements, the main limiting step of the evaporation stage is thermal transfer from the ...

Available online 23 January 2009

*Correspondence: Andrew Michelmore, Mawson Institute, Building V, Mawson Lakes Campus, University of South Australia, Mawson Lakes, 5095, SA, Australia e-mail: andrew.michelmore@ unisa.edu.au Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechan...

At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been...

Four thin-film adhesion characterization methods are proposed. Two of them are surface acoustic wave based and the two others emphasize the complementary nature between acoustic microscopy, scratch test and tensile experiments. A continuous wave scanning acoustic microscope was used to propagate surface modes in the specimen and to measure the surface acoustic wave velocity as a function of the...

This investigation consisted of two parts. In part one, a High Rate Physical Vapor Deposition Process was developed for the deposition of metals, alloys, compounds and dispersion strengthened alloys. The relationship between the deposition temperature, the microstructure and the mechanical properties was studied. The materials resulting from this process were shown to have oroperties very simil...

diamond like carbon (dlc) film was grown by hot filament chemical vapor deposition (hfcvd)technique. in the present work, we investigated the quality of the dlc films groew on the substratesthat were coated with various metal nanocatalysts (au and ni). a combination of ch4/ar/h2 rendersthe growth of carbon nanostructures technique (diamond like carbon). the utilized samples werecharacterized by...