For the future medical diagnostics, high-sensitive, rapid, and cost effective biosensors to detect the biomarkers have been desired. In this study, the polymer-based two-dimensional photonic crystal (2DPC) was fabricated using nanoimprint lithography (NIL) for biosensing application. In addition, for biosensing application, label-free detection of fibrinogen which is a biomarker to diagnose the...

Continuing scaling of complementary metal-oxidesemiconductor (CMOS) is crucial for the electronic industry because an integrated circuit (IC) with a smaller feature size can provide a smaller silicon area, lower power consumption, higher performance, cheaper price, etc. As the IC process nodes continue to shrink to 22nm and below, the IC industry will face severe manufacturing challenges with c...

In order to address the crucial problem of high-resolution low line-edge roughness resist for extreme ultraviolet (EUV) lithography, researchers require significant levels of access to high-resolution EUV exposure tools. The prohibitively high cost of such tools, even microfield tools, has greatly limited this availability and arguably hindered progress in the area of EUV resists. To address th...

Future lithography systems must produce microchips with smaller feature sizes, while maintaining throughputs comparable to those of today’s optical lithography systems. This places stringent constraints on the effective data throughput of any maskless lithography system. In recent years, we have developed a datapath architecture for directwrite lithography systems, and have shown that compressi...

Because the transistor was fabricated in volume, lithography has enabled the increase in density of devices and integrated circuits. With the invention of the integrated circuit, lithography enabled the integration of higher densities of field-effect transistors through evolutionary applications of optical lithography. In 1994, the semiconductor industry determined that continuing the increase ...

1Department of Biomedical Engineering, 2Department of Mechanical Engineering and Materials Science, 3Center for Biologically Inspired Materials and Material Systems, Duke University, Durham, North Carolina 27708-0281, USA *E-mail: [email protected] The advances in biotechnology and nanotechnology are spawning a new and exciting manufacturing tool – bionanofabrication – which enables revolutiona...

The development of low-cost, high-throughput lithographic techniques for the fabrication of sub-100 nm patterns has taken a dominant position in nanofabrication during the last decade. The unrelenting efforts that are undertaken in this field are the result of the corresponding high cost and low accessibility of state-of-the-art lithographic techniques—for example, deep-UV and extreme-UV photol...

The half-tone lithography using pixilated chromium masks in a projection stepper is an established technology in microoptics fabrication. However, the projection lithography tool is comparably expensive and the achievable lateral resolution is typically limited. By using pixel diffraction effects, binary and continuous profile lithography with submicron resolution can be installed on a conventi...

At present, the question of the move from 193 to 157nm lithography is under discussion. There are still several major issues such as the development of 157nm photo-resists and pellicles, as well as calcium-fluoride lens material availability. The extension of the 193nm lithography down to the 65and 45-nm half pitch technologies is now considered as a serious alternative. This requires several t...

We investigate the performance of waveguide Bragg gratings as a function of imperfections introduced in the fabrication process. Effects of stitching errors introduced in the electron-beam and UV-lithography are discussed in details. OCIS codes: (050.2770) Gratings, (130.7408) Wavelength filtering devices, (220.3740) Lithography.