نتایج جستجو برای: silicon wafer

تعداد نتایج: 100624  

Journal: :Applied Physics A Materials Science & Processing 1996

Journal: :Resources Recycling 2022

태양광 폐실리콘 웨이퍼에서 회수한 실리콘과 카본블랙을 활용하여 탄화규소 분말을 제조하였다. 발전시장에서 결정질 실리콘 모듈이 90% 이상을 차지한다. 모듈의 사용기한이 도래함에 따라 환경과 경제적인 측면에서 실리콘을 회수하고 활용하는 기술은 매우 중요하다. 본 연구에서는 폐패널에서 원료로 활용하기 위하여, 순도 95.74% 웨이퍼로부터 정제과정을 거쳐 99.99% 회수하였다. 분말 합성특성을 살펴보기 정제된 분말과 탄소분말을 혼합한 후, Ar 분위기에서 열처리(1,300℃, 1,400℃, 1,500℃)과정을 수행하였다. 분말의 특성을 입도분포, XRD, SEM, ICP, FT-IR 및 Raman 분석기를 사용하여 분석하였다.

2008
E. Jesper Eklund Andrei M. Shkel Svenja Knappe Elizabeth Donley John Kitching

This paper demonstrates spherical vapor cells intended to be used in chip-scale atomic devices. A micro glass blowing process is introduced, n which multiple glass spheres are simultaneously shaped on the top of a silicon wafer and subsequently filled with rubidium. In the presented abrication process, an array of cylindrical cavities is first etched in silicon. Next, a thin glass wafer is anod...

Journal: :Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering 2019

Journal: :Electronics and Communications in Japan 2020

Journal: :Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 2020

Journal: :Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 2003
Hye-Young Chung Sang-Hak Lee Young-Hun Kim Ki-Sang Lee Dae-Hong Kim

An etching technique for the determination of the metallic impurities distribution in silicon wafers has been developed. An area of 10 mmphi and 10 microm depth was etched by 100 microL of an etching solution with a HF and HNO3 mixture. The acid matrix was evaporated on the wafer surface by IR lamp illumination and vacuum exhaust. Metallic impurities remaining on the wafer surface were redissol...

2001
Gökhan Perçin Butrus T. Khuri-Yakub

A technique for resist deposition using a novel fluid ejection method is presented in this paper. An ejector has been developed to deposit photoresist on silicon wafers without spinning. Drop-on-demand coating of the wafer reduces waste and the cost of coating wafers. Shipley 1400-21, 1400-27, 1805, and 1813 resists were used to coat sample 3and 4-in wafers. Later, these wafers were exposed and...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید