Due to their polymorphism, TiO2 films are quintessential components of state-of-the-art functional materials and devices for various applications from dynamic random access memory solar water splitting. However, contrary other semiconductors/dielectric materials, the relationship between structural/morphological electrical properties at nano microscales remains unclear. In this context, morphol...

the lethality of pulsed ultra-violet (uv) rich light for the inactivation of pathogenic bacteria has been investigated. a low pressure xenon filled flash lamps that produced uv intensities have been used. the pulsed operation of the system enable the release of electrical energy stored in the capacitor into the flash lamp within a short time and produces the high current and high peak power req...

The scope of this work was to optimize the reactant delivery parameters for plasma enhanced chemical vapor deposition (PECVD) p-type Cu2O films from Cu(hfac)(tmvs), with aim explore an alternative other large-area techniques such as sputtering. While n-type metal oxide semiconductors amorphous indium gallium zinc have now been developed and offer significantly improved device performance over h...

We report on low-temperature and low-pressure deposition conditions of 140 °C 1.5 mTorr, respectively, to achieve high-optical quality silicon nitride thin films. deposit the films using an electron cyclotron resonance plasma-enhanced chemical vapour (ECR-PECVD) chamber with Ar-diluted SiH4, N2 gas. Variable-angle spectroscopic ellipsometry was used determine thickness refractive index films, w...