نتایج جستجو برای: point defect diffusion

تعداد نتایج: 768807  

Journal: :The Journal of chemical physics 2011
Eduardo Machado-Charry Laurent Karim Béland Damien Caliste Luigi Genovese Thierry Deutsch Normand Mousseau Pascal Pochet

Unbiased open-ended methods for finding transition states are powerful tools to understand diffusion and relaxation mechanisms associated with defect diffusion, growth processes, and catalysis. They have been little used, however, in conjunction with ab initio packages as these algorithms demanded large computational effort to generate even a single event. Here, we revisit the activation-relaxa...

2017
Yong Han Ann Lii-Rosales Y. Zhou C.-J. Wang M. Kim James W. Evans A. Lii-Rosales M. C. Tringides C.-Z. Wang P. A. Thiel

Theory and stochastic lattice-gas modeling is developed for the formation of intercalated metal islands in the gallery between the top layer and the underlying layer at the surface of layered materials. Our model for this process involves deposition of atoms, some fraction of which then enter the gallery through well-separated point-like defects in the top layer. Subsequently, these atoms diffu...

Journal: :Journal of the American Chemical Society 2012
Fei Yao Fethullah Güneş Huy Quang Ta Seung Mi Lee Seung Jin Chae Kyeu Yoon Sheem Costel Sorin Cojocaru Si Shen Xie Young Hee Lee

Coexistence of both edge plane and basal plane in graphite often hinders the understanding of lithium ion diffusion mechanism. In this report, two types of graphene samples were prepared by chemical vapor deposition (CVD): (i) well-defined basal plane graphene grown on Cu foil and (ii) edge plane-enriched graphene layers grown on Ni film. Electrochemical performance of the graphene electrode ca...

Journal: :ESAIM: Mathematical Modelling and Numerical Analysis 1990

2011
H. L. Meng K. S. Jones

Short-time/low-temperature thermal oxidation is known to lead to point defect perturbations in silicon. This study investigates the interaction between oxidation-induced point defects and type II dislocation loops intentionally introduced in silicon via ion implantation. The type II (end-of-range) dislocation loops were introduced via implantation of either Sif ions at 50 keV or Ge+ ions at 100...

Journal: :AIP Advances 2023

The correlation between the internal quantum efficiency (IQE) and effective diffusion length estimated by cathodoluminescence intensity line profile near dark spots, including effect of non-radiative recombination due to point defects, was experimentally clarified for AlGaN multiple wells (MQWs) on face-to-face annealed (FFA) sputter-deposited AlN templates with different IQEs similar dislocati...

Journal: :EURASIP Journal on Advances in Signal Processing 2012

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