To use Ag nanowires for various industries, it is crucial to develop an appropriate patterning method. There are types of methods, but there has been no comprehensive review discussing and summarizing them. This paper provides overview the techniques nanowire electrodes, including photolithography, nanoimprint lithography, inkjet printing, electrohydrodynamic jet other emerging methods. These t...

In this article, we present our study on surface plasmon SP assisted contact scheme nanoscale photolithography technique. Sub-100-nm features on a metallic mask, fabricated by e-beam lithography, were successfully transferred to a resist pattern in a setup close to traditional photolithography. Our previous work based on finite difference time domain simulation reveals the mechanism of SP-light...

Large-scale fabrication of graphene-based devices is an aspect of great importance for various applications including chemical and biological sensing. Toward this goal, we present here a novel chemical route for the site-specific realization of devices based on reduced graphene oxide (RGO). Electrodes patterned by photolithography are modified with amino functional groups through electrodeposit...

 Due to the small roughness in the surface of the crystal sample, it is hard to use photolithography in the patterning process of the Bi2Sr2CaCu2O8+δ intrinsic Josephson junction. In this paper, we report a simple technique for fabricating the Bi2Sr2CaCu2O8+δ intrinsic Josephson junctions. In the patterning process metal masks are used instead of photolithography and argon ion milling is appli...

We conduct exact analysis of serial production lines with deterministic service durations and various classes of random statedependent setups between customers. Our focus is on assessing the production rate, or just-in-time (JIT) throughput. We demonstrate that such systems can be modeled as a Markov chain and consider various types of setups inspired by clustered photolithography tools in semi...

In-situ aberration measurement often requires indirect methods that retrieve the pupil phase from the measured images and presents unique challenges to the engineers involved. Phase wheel monitor allows such in-situ measurement of aberrations in photolithography systems. The projection lens aberrations may be obtained with high accuracy from images of phase wheel targets printed in photoresist....

A process combining conventional photolithography and a novel inkjet printing method for the manufacture of high sensitivity three-dimensional-shape (3DS) sensing patches was proposed and demonstrated. The supporting curvature ranges from 1.41 to 6.24 × 10(-2) mm(-1) and the sensing patch has a thickness of less than 130 μm and 20 × 20 mm(2) dimensions. A complete finite element method (FEM) mo...