نتایج جستجو برای: pecvd

تعداد نتایج: 857  

2010
Thomas Sordel Fabien Sauter Catherine Pudda Michel De Waard Christophe Arnoult Michel Vivaudou

Obtaining high-throughput electrophysiology recordings is an ongoing challenge in fundamental ion channel biophysics and drug discovery. One particular area of development is the replacement of glass pipettes with planar devices in order to increase the throughput. However, successful patch-clamp recording depends on an ideal surface coating that promotes and stabilizes giga-seals formation. He...

2006
L. Tao S. Ramachandran C. T. Nelson T. H. Lee

Diamond like carbon (DLC) films were deposited on Si and then patterned to form 40 nm features as nanoimprint templates. A plasma enhanced chemical vapor deposition (PECVD) system with CH4 precursor was used to deposit DLC films on Si and quartz substrates. These films were then characterized using Raman spectroscopy, atomic force microscopy (AFM), nanoindentation, and contact angle measurement...

2009
Thomas Sordel Stéphanie Garnier-Raveaud Fabien Sauter Catherine Pudda Anne Simon Michel De Waard Christophe Arnoult Michel Vivaudou François Chatelain Nathalie Picollet-D’hahan

Obtaining high-throughput electrophysiology recordings is an ongoing challenge in fundamental ion channel biophysics and drug discovery. One particular area of development is the replacement of glass pipettes with planar devices in order to increase the throughput. However, successful patchclamp recording depends on an ideal surface coating that promotes and stabilizes giga-seals formation. Her...

2014
Sebastian Gerke Hans-Werner Becker Detlef Rogalla Giso Hahn Reinhart Job Barbara Terheiden

Hydrogenated intrinsic amorphous silicon ((i) a-Si:H) layers deposited on n-type crystalline silicon (c-Si) by plasma enhanced chemical vapour deposition (PECVD) are investigated during long-time thermal treatment (100 h at 200°C) with regard to the depth profile of hydrogen in the a-Si layer and its diffusion into the c-Si bulk. The morphology of the (i) a-Si:H is manipulated by the PECVD proc...

2007
M. G. Hussein K. Wörhoff G. Sengo A. Driessen

Silicon oxynitride (SiOxNy:H) layers were grown from 2%SiH4/N2 and N2O gas mixtures by plasma-enhanced chemical vapor deposition (PECVD). Layer properties such as refractive index, deposition rate, thickness non-uniformity and hydrogen bond content were correlated to the relevant deposition parameters including radio frequency power, chamber pressure, total gas flow, substrate temperature and N...

Journal: :Journal of the Korean Institute of Electrical and Electronic Material Engineers 2010

Journal: :Coatings 2021

Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since growth vertical graphene different on each base material has specific deposition setting parameters, it necessary examine separately. For this reason, full factor design experiment was performed with 26 = 64 rounds, contained additional 5 centr...

Journal: :Journal of biotechnology 2006
Thomas Sordel Stéphanie Garnier-Raveaud Fabien Sauter Catherine Pudda Frédérique Marcel Michel De Waard Christophe Arnoult Michel Vivaudou François Chatelain Nathalie Picollet-D'hahan

Obtaining high-throughput electrophysiological recordings is an ongoing challenge in ion channel biophysics and drug discovery. One particular area of development is the replacement of glass pipettes with planar devices in order to increase throughput. However, successful patch-clamp recordings depend on a surface coating which ideally should promote and stabilize giga-seal formation. Here, we ...

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