This study introduces a reversible optical fulladder. Also optical NOT and NOR gates are implemented through Electro-Absorption-Modulator / Photo Detector (EAM/PD) pairs, were utilized for fulfilling reversible R gate. Then, reversible fulladder was designed based on the proposed reversible optical R gate. The operation of the suggested fulladder was simulated using Optispice and it was fou...

One of the major yield killers of power-amplifier PHEMTbased MMICs is fabricating a T-shaped gate with gate periphery of several tens of mm. We have investigated a novel PMMA/PMGI/PMMA tri-layer resist scheme for T-Gate definition of PHEMTs with 0.25-μm gate length and in-situ Ar ion beam treatment before gate evaporation as methods for eliminating this problem. We intend to extend this technol...

We demonstrated gate voltage control of spin precession in InGaAs mesoscopic ring arrays based on Rashba spin orbit interaction (SOI). We employed 100 nm ALD Al2O3 and 150 nm sputtered SiO2 gate insulators combined with large and small ring arrays to compare the gate sensitivity for the spin precession. Al’tshuler-Aronov-Spivak (AAS) oscillations were clearly observed and the oscillation phases...

A proof-of-concept metal–insulator–semiconductor (MIS) AlGaN/GaN high-electron mobility transistor (HEMT) that uses a self-aligned 10 nm AlOx gate insulator and SiNx passivation in the device access regions was investigated. Self-alignment of the gate insulator to metal was achieved by utilizing a submicron tri-layer photoresist pattern to lift-off sequentially-deposited AlOx dielectric and Ni/...

In the aggressive scaling of the gate dielectric thickness for continuous shrinkage of MOSFETs, a increase in the gate resistance emerges as one of major concerns from the viewpoint of eliminations in both the voltage drop through the gate under higher gate leakage current [1] and the gate depletion effect [2]. Especially, in case of poly-Si gate, with decreasing gate size, the gate depletion e...

Quantum-dot cellular automaton (QCA) is a novel nanotechnology with a very different computational method in compared with CMOS, whereas placement of electrons in cells indicates digital information. This nanotechnology with specifications such as fast speed, high parallel processing, small area, low power consumption and higher switching frequency becomes a promising candidate for CMOS tec...