Introduction: Surface treatment is an important technique to increase adhesion between implants and bones, improving its mechanical characteristics consequently the patient’s comfort. Objectives: Ni-Cr alloys were object of study in this work, with purpose analyzing evaluating effect thin films deposition titanium nitride via plasma, on surface comparing cathodic cage (CC) hollow cathode (HC) m...

Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

This paper proposes a procedure for process parameters design by combining both modeling and optimization methods. The proposed procedure integrates the Taguchi method, the artificial neural network (ANN), and the genetic algorithm (GA). First, the Taguchi method is applied to minimize experimental numbers and to collect experimental data representing the quality performances of a system. Next,...

A major disadvantage of energy saving glass using tin oxide (SnO2) thin film is that SnO2 attenuates the mobile signal from passing through it. In order to improve such signal transmission, a frequency selective surface (FSS) structures are designed on SnO2 thin film. In this paper, SnO2 thin film with FSS structure was fabricated using combination of printed circuit board technology and reacti...

We report on a novel microfabrication method to fabricate aluminum nitride (AlN) piezoelectric microstructures down to 2 microns size by a surface micromachining process. Highly c-axis oriented AlN thin films are deposited between thin Cr electrodes on polysilicon structural layers by rf reactive sputtering. The top Cr layer is used both as a mask to etch the AlN thin films and as an electrode ...

Nitrides of aluminum (Al) and titanium (Ti) mixtures have long been studied used as commercial coatings because their high hardness oxidation resistance due to the formation an alumina layer on coating surface. To fully understand contribution Al Ti properties film, a combinatorial deposition approach was employed using half-disk targets. Film growth carried out magnetron sputtering system powe...

Titanium nitride (TiN) is a material of interest for electrodes owing to its high-temperature stability, robustness, low-cost, and suitable electrical properties. Herein, we studied the surface morphology properties TiN thin film deposited onto an Si/SiO2 <100> substrate through direct current (DC) sputtering with high-purity target in argon-gas environment. The significantly improved inc...

The (secondary) electron emission from multilayered Al$_2$O$_3$/TiN membranes has been investigated with a hemispherical collector system in scanning microscope for electrons energies between 0.3 and 10 keV. These ultra-thin are designed to function as transmission dynodes novel vacuum multipliers. Two different types, bi-layer tri-layer, have manufactured by means of atomic-layer deposition (A...

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