This work investigates the use of finite abstractions to study the finite-horizon probabilistic invariance problem over Stochastic MaxPlus-Linear (SMPL) systems. SMPL systems are probabilistic extensions of discrete-event MPL systems that are widely employed in the engineering practice for timing and synchronisation studies. We construct finite abstractions by re-formulating the SMPL system as ...

Materials and Methods Nanofluidic chips Nanofluidic chips were fabricated from a silicon wafer with 2 μm thermal oxide in cleanroom facilities at Chalmers University of Technology. Nanochannels were created by electron-beam lithography (JBX-9300FS/JEOL Ltd) and reactive ion etching (Plasmalab 100 ICP180/Oxford Plasma Technology). Microchannels were made by optical lithography (MA 6/Suss MicroTe...

Parabolic compound refractive lenses are high quality optical components for hard x rays. They are particularly suited for full field imaging, with applications in microscopy and x-ray lithography. Taking advantage of the large penetration depth of hard x rays, the interior of opaque samples can be imaged with submicrometer resolution. To obtain the three-dimensional structure of a sample, micr...

In this contribution we describe the application of Ink-Jet printing and Stencil Lithography in bionanotechnology. Both techniques are alternative patterning methods that can be used for the fabrication of biocompatible microand nanostructures out of the costly and restricted clean room environment. The applications presented in this contribution are 1) the cell patterning using Au dot arrays d...

A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatia...

The development of nanotechnology faces many problems, one of which is lack of a fast and cheap method for fabricating structures whose dimensions are less than 0.1 μm. One method to solve this problem is nanoimprint lithography (NIL). The method of fabricating nanometer scale patterns by NIL was first proposed by Chou1,2 in 1995. Nanoimprint lithography creates patterns by the mechanical defor...

Abstract Advances in direct laser writing to attain super-resolution are required improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed the resolution of while preventing chromatic aberration characteristics conventional multicolor lithography, thus offering r...

Lithography is the most challenging technology in the semiconductor industry. The most promising next generation lithography technology is extreme ultraviolet lithography (EUVL). EUVL was proposed long ago, in 1988, but its implementation has been postponed several times. Presently, most “showstoppers” are gone, but there are still several challenges that need to be addressed. The semiconductor...

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