نتایج جستجو برای: titanium nitride thin film reactive sputtering

تعداد نتایج: 388612  

2007
Akito ENDO Norimichi KAWASHIMA Shinichi TAKEUCHI Mutsuo ISHIKAWA Minoru Kuribayashi KUROSAWA

We deposited a lead zirconate titanete (PZT) polycrystalline film on a titanium substrate by the hydrothermal method and fabricated a transducer using the PZT film for use as an ultrasound probe. A 10MHz miniature one-dimensional-array medical ultrasound probe containing the PZT film was developed. After sputtering titanium on the surface of a hydroxyapatite substrate, the titanium film on the ...

Journal: :Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 1992

Journal: :IOP Conference Series: Materials Science and Engineering 2016

2002
Neelam Kumari Ashwini K. Singh

AlN thin films deposited at room temperature by reactive DC magnetron sputtering of Al target in pure argon and nitrogen atmosphere. Thin films were deposited on glass and silicon (Si) substrate at different DC power. The variation of DC power on the structural, electrical and optical properties of the films were investigated. Enhancement of crystallinity and conductivity was observed with incr...

2011
Shingo Yoneoka Yi-Hsuan Lin Scott Lee Chu-En Chang

Standard nitride recipes for Savannah were tried first. Woollam M2000 spectroscopic ellipsometer (Woollam) and SSI SProbe X-Ray Photoemission Spectrometer (XPS) were used for thickness and composition measurements. However, the results were undesirable. For example, the results of Woollam showed that Hf3N4 films with 500, 375, and 250 cycles well matched to the corresponding HfO2 models. Furthe...

Journal: :Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 1992

2017
Achim von Keudell Carles Corbella

The interaction of plasmas with surfaces is dominated by synergistic effects between incident ions and radicals. Film growth is accelerated by the ions, providing adsorption sites for incoming radicals. Chemical etching is accelerated by incident ions when chemical etching products are removed from the surface by ion sputtering. The latter is the essence of anisotropic etching in microelectroni...

Journal: :Journal of Non-crystalline Solids 2021

Using high-intensity infrared (IR) rays from the SPring-8 synchrotron radiation, we investigated relationship between photo-induced deformation and in-plane distribution of chemical bonding state amorphous carbon nitride (a-CNx) thin films prepared via reactive sputtering. The film deposited at 573 K has largest amount 873 shows no photoresponse. When beam diameter was reduced to a few micromet...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید