Top-down approach for vertically aligned CNWs has not reported yet although it is necessary for immediate integration of CNWs with micro and nano systems. In this paper, vertically aligned pyrolyzed carbon nanowires (CNWs) is fabricated by photolithography with modification and pyrolysis as a top-down approach which the control of shape and position of CNWs is reliable. Subμm high aspect ratio ...

A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O2 plasma treatment to PDMS to...

A rapid and simple fabrication method to construct tiny shadow-masks and their use in multi-layer surface patterning with in-situ micromechanical alignment is presented. Free-standing shadow-mask membranes are made of a 5-μm-thick SU-8 based resist layer by photolithography. They are supported by a 1-mm-large and 150-μm-thick SU-8 rim. The membrane has apertures with feature sizes ranging from ...

Back Cover: In article number 2000466 by Sandra Schlögl and co-workers, the introduction of photolabile o-nitrobenzyl ester chromophores endows epoxy-anhydride vitrimers with spatially controlled solubility properties. Positive-tone microstructures are inscribed photolithography patterns thermally erased via catalyzed transesterifications.

This article describes FLASH (Fast Lithographic Activation of Sheets), a rapid method for laboratory prototyping of microfluidic devices in paper. Paper-based microfluidic devices are emerging as a new technology for applications in diagnostics for the developing world, where low cost and simplicity are essential. FLASH is based on photolithography, but requires only a UV lamp and a hotplate; n...

We present a low cost and practical approach to integrate 3D ordered macroporous polyfluoropolyether (PFPE) patterns into a microchannel by a series of porous pattern fabrication processes and subsequent photolithography in a site- and shape-selective manner. The 3D ordered macroporous patterns with high-resolution edges were firstly fabricated by microtransfer molding (μ-TM) of the sacrificial...

In this paper, based on numerical study using Finite Difference Time Domain method, we discuss two possible illumination schemes utilizing surface plasmon effects to achieve high density sub-100 nm scale photolithography by using ultraviolet light from a mercury lamp. In the illumination schemes discussed in this paper, a thin film layer, named as shield layer, is placed in between a photoresis...

A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O2 plasma treatment to PDMS to...

The reinforcement of photoresins with continuous carbon fibers is discussed in this paper. The processing was conducted in an automated desktop photolithography unit (ADPU) developed and built in-house. Continuous fibers were added in situ to the photoresin to obtain composite samples containing over 20 vol% of the fibers. The tensile strength of these composites improved by at least a factor o...

A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at 1 Torr. SiO2 is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photor...