Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the ...

VOLUME 14, NUMBER 2, 2003 LINCOLN LABORATORY JOURNAL 221 O  ,   of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced wi...

Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of threedimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the...

Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...

Extreme ultraviolet lithography is one of the modern lithography tools for high-volume manufacturing with 22 nm resolution and beyond. But critical challenges exist to the design and fabrication of large-scale and highly efficient diffraction transmission gratings, significantly reducing the feature sizes down to 22 nm and beyond. To achieve such a grating, the surface flatness, the line edge r...

Despite the attractiveness of low temperature hydrothermal processes, the synthesis of vertical ZnO nanostructures has mostly been limited to rigid substrates. Moreover, patterned growth of nanostructures is also commonly carried out on rigid substrates, since conventional optical lithography is not easily applied to polymeric substrates, as focusing and reaction of the substrate with the organ...

Soft lithography, a set of techniques for microfabrication, is based on printing and molding using elastomeric stamps with the patterns of interest in basrelief. As a technique for fabricating microstructures for biological applications, soft lithography overcomes many of the shortcomings of photolithography. In particular, soft lithography offers the ability to control the molecular structure ...

The nonlinear Talbot effect, in which self-images are formed by generated parametric light from the nonlinear optical process, is presented in this paper. The comparison is made between the conventional Talbot effect and the newly observed nonlinear case. The essence of such nonlinear self-images is provided and future work on this effect is also discussed. The conceptional extension achieved h...

In this paper, we formulate the problem of early classification of time series data, which is important in some time-sensitive applications such as healthinformatics. We introduce a novel concept of MPL (Minimum Prediction Length) and develop ECTS (Early Classification on Time Series), an effective 1-nearest neighbor classification method. ECTS makes early predictions and at the same time retai...

Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...