In this supplement to formal class lectures, we develop the small signal models for metaloxide-semiconductor field-effect transistor (MOSFET) technologies. Despite the exclusive focus on MOS technologies, the reader will surmise that the fundamental concepts and strategies of small signal modeling presented herewith are generally applicable to bipolar, III-V compound, and other semiconductor de...

We report, to the best of our knowledge, the first realization of a multi-wavelength distributed feedback (DFB) semiconductor laser array with an equivalent chirped grating profile based on equivalent chirp technology. All the lasers in the laser array have an identical grating period with an equivalent chirped grating structure, which are realized by nonuniform sampling of the gratings. Differ...

The performance of the manufacturing process in each of these areas determines the overall manufacturability of the process. As device geometries are reduced, understanding and minimizing the sources of process-induced defects is critical to achieving and maintaining high device yields. This paper presents comprehensive the investigating a novel metrology on semiconductor process module integra...

Today’s leading edge microprocessors like the Intel’s Itanium 2 Processor feature over 220 million transistors in 0.18μm semiconductor process technology. Nanotechnology that continues to drive Moore’s Law provides a doubling of the transistor density every two years. This indicates that a Billion transistor chip is possible in the 65 nm technology within the next 3 to 4 years. Such chips can b...