نتایج جستجو برای: photoresist

تعداد نتایج: 1295  

Journal: :Journal of Photopolymer Science and Technology 2002

Journal: :Journal of Photopolymer Science and Technology 1998

Journal: :Chemical communications 2007
Tuan Anh Pham Pilnam Kim Moonkyoo Kwak Kahp Y Suh Dong-Pyo Kim

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.

2014
V Velmurugan J P Raina

Composites with nanoparticles and polymers can improve the functionalities and existing formulations. In this work we synthesized Graphene Oxide and is incorporated into an epoxy based negative tone photoresist in different weight percentages. Thermal conductivity studies were carried out on those composites and it was found that 13 % by weight is the optimized loading to have an enhanced therm...

2008
A. Tay

Abstract: Baking of semiconductor substrate is common and critical to photoresist processing in the lithography sequence. Temperature uniformity control is an important issue in photoresist processing with stringent specifications and has a significant impact on the linewidth or critical dimension (CD). In this work, we present the development of a ratio control strategy for controlling tempera...

Journal: :CoRR 2006
Ruey-Fang Shyu Hsiharng Yang Wen-Ren Tsai Jhy-Cherng Tsai

This paper presents a simple method to fabricate micro-ball lens and its array. The key technology is to use the hydrophobic characteristics of polyterafluoroethylene (PTFE) substrate. High contact angle between melted photoresist pattern and PTFE can generate micro-ball lens and its array. PTFE thin film was spun onto a silicon wafer and dried in oven. Photoresist AZ4620 was used to pattern mi...

2013

exposure, photoresist bake, development and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with large mask-to-resist gap. Optolith is fully interfaced to all commercial IC layout tools conforming to GDSII and CIF formats, as well as to a special propr...

1997
Robert W. Cohn Anatoly A. Vasiliev Wenyao Liu David L. Hill

Arbitrary complex-valued functions can be implemented as arrays of individually specified diffusers. For any diffuser, only average step height and vertical roughness are needed to control phase and amplitude. This modulation concept suggests potentially low-cost fabrication methods in which desired topographies are patterned by exposing photoresist with partially developed speckle patterns. An...

Journal: :Nanotechnology 2009
Xugang Xiong Chia-Ling Chen Peter Ryan Ahmed A Busnaina Yung Joon Jung Mehmet R Dokmeci

We report an effective technique for the controlled assembly of single-walled carbon nanotubes (SWNTs) and demonstrate organized high density network architectures on soft polymeric substrates. We utilize the surface energy differential between a plasma treated (hydrophilic) parylene-C surface and a photoresist (hydrophobic) surface to create microscale patterns of SWNT networks on a 10 microm ...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید