Carbon microelectromechanical system (C-MEMS) and carbon nanoelectromechanical (C-NEMS) have been identified as promising technologies for a range of biotech applications, including electrochemical biosensors, biofuel cells, neural probes, dielectrophoretic cell trapping. Research teams around the world devoted more time to this field. After almost two decades efforts on developing C-MEMS C-NEM...

By means of delicate and conventional methods based on photolithography and hot filament chemical vapor deposition (HFCVD) technology, a novel boron-doped diamond micro-network (BDDMN) film was fabricated, and this micro-structure showed excellent electrochemical sensing properties.

We have previously reported on a maskless photolithography device for surface micropatterning and microfabrication by modifying a commercially available liquid crystal display projector. For the prototype, 10-microm resolution was achieved by downsizing the image on a 0.7-in. liquid crystal display panel to an area of 8 x 6 mm and projecting it on a fixed stage. Here, we report on a second-gene...

A method for fabricating DNA polymer brush arrays using photolithography and plasma etching followed by solid-phase enzymatic DNA amplification is reported. After attaching oligonucleotide primers to the surface of a glass coverslip, a thin layer of photoresist is spin-coated on the glass and patterned via photolithography to generate an array of posts in the resist. An oxygen-based plasma is t...

The implementation of Automated Material Handling Systems (AMHS) in 300mm semiconductor facilities provides the opportunity to realize significant benefits in fabricator productivity and performance. The leverage associated with automated reticle delivery to photolithography process tools may be less apparent than a fab-wide AMHS. However, a high product mix environment requires the tracking, s...

While the critical dimension in the microelectronics industry is continually going down due to developments in photolithography, it is coming at the expense of exponential increase in lithography tool costs and rising photomask costs. Step and Flash Imprint Lithography (S-FIL) is a nano-patterning technique that results in significantly lower cost of the lithography tool and process consumables...

In this work, two procedures for fabrication of polymeric microneedles based on direct photolithography, without any etching or molding process, are reported. Polyethylene glycol (average molecular weight 250 Da), casted into a silicone vessel and exposed to ultraviolet light (365 nm) through a mask, cross-links when added by a commercial photocatalyzer. By changing the position of the micronee...

The maskless photolithography device we developed requires no photomask, by modifying Liquid Crystal Display (LCD) projector optics from magnified to reduced projection. The second-generation device we developed produces a practical centimeter-scale micropattern by dividing a large mask pattern and divisionally exposing it synchronized with an auto-XY stage, applying it to cell micropattern and...