In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...

The ability to fabricate structures from the microto the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of microand nanotechnology and the nanosciences. The semiconductor industry has been pushing high-precision nanoscale lithography to manufacture ever-smaller transistors and higher-density integrated circuits (ICs). Critical issues, su...

Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining the throughput of one wafer per sixty seconds per layer achieved by today’s optical lithography systems. To achieve this throughput with a direct-write maskless lithography system, using 25 nm pixels for 50 nm feature sizes, requires data rates of about 10 Tb/s. In a previous paper, we present...