Jointly sponsored by ACM and IEEE, the International Conference on Computer-Aided Design (ICCAD) is a premier forum to explore new challenges, present leading-edge innovative solutions, identify emerging technologies in electronic design automation (EDA) research areas. ICCAD covers full range of computer-aided (CAD) topics—from device circuit levels up through system level, as well post-CMOS d...

Cardiac assist devices (CAD) cause endothelial dysfunction with considerable morbidity. Employment of pulsatile CAD remains controversial due to inadequate perfusion curves and costs. Alternatively, we are proposing a new concept of pulsatile CAD based on a fundamental revision of the entire circulatory system in correspondence with the physiopathology and law of physics. It concerns a double l...

A new TCAD shell is presented which is capable of performing complex development tasks by using LISP as interaction and programming language. Data level integration of simulation tools and capabilities required in process and device development into a homogeneous environment is based on a binary implementation of the Profile Interchange Format.

Computer-aided design (CAD) techniques are absolutely essential to harness the ever-increasing complexity of the microsystem design. Similarly, the technology CAD (TCAD) tools played a key role in the development of new technology generations. Although there is a common belief that the TCAD tools have been trailing the technology development, the situation has been changing very significantly e...

Electrical model of a magnetic tunnel junction is developed in Verilog-A language, which can use CAD systems to design an integrated circuit spintronics devices. In order check the correct operation verification tests were created and carried out Cadence ADE. Each test corresponds operating mode junction: switching, generation, rectification. Thus, be used simulate hybrid circuits comprising CM...

End of the roadmap integrated circuit interconnects suffer from capacitance variability due to line edge roughness (LER), significantly impacting overall circuit performance. We forecast the capacitance variability of short range interconnects with realistic line edge roughness at the upcoming 45, 32, and 22 nm technology nodes using a fast TCAD capacitance tool. Capacitance variability is layo...

We present a novel methodology for characterization of sub-quartermicron CMOS technologies. It involves process calibration, device calibration employing two-dimensional device simulation and automated Technology Computer Aided Design (TCAD) optimization and, finally, transient mixed-mode device/circuit simulation. The proposed methodology was tested on 0.25 m technology and applied to 0.13 m t...

Integrated circuits are often designed using simple and conservative 'design rules' to ensure that the resulting circuits will meet reliability goals. This simplicity and conservatism leads to reduced performance for a given circuit and metallization technology. To address this problem, we had developed a TCAD tool, ERNI, which allows process-sensitive and layout-specific reliability estimates ...

Advances in lithography have contributed significantly to the advancement of the integrated circuit technology. While nonoptical next-generation lithography (NGL) solutions are being developed, optical lithography continues to be the workhorse for high-throughput very-large-scale integrated (VLSI) lithography. Extending optical lithography to the resolution levels necessary to support today’s a...