This investigation reports on the characteristics of MAPbI3 perovskite films on obliquely sputtered ITO/glass substrates that are fabricated with various sputtering times and sputtering angles. The grain size of a MAPbI3 perovskite film increases with the oblique sputtering angle of ITO thin films from 0° to 80°, indicating that the surface properties of the ITO affect the wettability of the PE...

Mixing dielectric materials in solid-thin-film deposition allows the engineering of thin films' optical constants to meet specific thin-film-device requirements, which can be significantly useful for optoelectronics devices and photonics technologies in general. In principle, by use of radio-frequency (rf) magnetron sputtering, it would be possible to mix any two, or more, materials at differen...

This paper reports the effect of the different deposition methods towards the ZnO nanostructure crystal quality and film thickness on the polyimide substrate. The ZnO film has been deposited by using the spray pyrolysis technique, sol-gel and RF Sputtering. Different methods give a different nanostructure of the ZnO thin film. Sol gel methods, results of nanoflowers ZnO thin film with the thick...

It has been found that in the etching of SiO2 using CHF3 in an inductively coupled plasma reactor of the planarized coil design, a thin steady state fluorocarbon film can play an important role in determining the rate of etching. This etching is encountered as the amount of bias power used in the SiO2 etching process is increased, and a transition from fluorocarbon film growth on the SiO2 to an...

Titanium is a highly reactive metal so that a thin layer of oxide forms on its surface whenever exposed to the air or other environments containing oxygen. This layer increases the corrosion resistance of titanium. The oxide film is electrochemically formed through anodizing. In this study, anodizing of titanium was performed in phosphate-base solutions such as H3Po4, NaH2Po4, and Na2Hpo4 at 9....

In this work, the influence of the substrate bias on the crystalline structure and surface composition of Ti6Al4V thin films prepared by rf magnetron sputtering were studied. Samples were grown onto two different types of substrates: AISI 420 steel and common glass using a Ti6Al4V (99.9 %) target. Substrate bias was varied from –100V to –200 V. Samples were characterized by X-ray diffraction (X...

Copper thin films with nano-scale structure have numerous applications in modern technology.  In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...

Nanocomposite films of metal nitrides such as TiN/Si3N4, TiN/BN, and CrN/AlN have attracted substantial attention as coating materials for improving hardness and saving rare metals. It is difficult to prepare composite films consisting of nitride and oxide by conventional reactive sputtering methods. Nose et al. developed a differential pumping cosputtering (DPCS) system, which can fabricate di...